In this letter, we investigate bipolar resistive switching of CuTCNQ-based memory cells in which various types of oxides Are incorporated as dedicated switching layer (SL) in a bottom electrode\oxide\CuTCNQ\top electrode configuration. The bottom electrode was Pt as well as n(+)Si. As oxide SL, we used Al2O3, HfO2, ZrO2, and SiO2. Au was employed as the top electrode. The basic memory characteristics appear to be independent of the type of oxide used. This gives clear indication that the materials investigated as SL mainly act as matrix in which conductive channels are formed and dissolved.status: publishe
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
For the applications of resistive random access memory (RRAM), we study the complementary resistive ...
The insertion of a metal layer between an active electrode and a switching layer leads to the format...
In this letter, we investigate bipolar resistive switching of CuTCNQ-based memory cells in which var...
Resistive switching in nonvolatile, two terminal organic memories can be due to the presence of a na...
The generally observed bipolar electrical switching of Cu\CuTCNQ\metal memories (metal=Al,Yb,Ti) bet...
Resistive switching in nonvolatile, two terminal organic memories can be due to the presence of a na...
This paper presents recent progress in resistive oxide memories and their integration into advanced ...
This paper presents recent progress in resistive oxide memories and their integration into advanced ...
In this article, we investigate extensively the bipolar-switching properties of Al2O3-and HfO2-based...
Electrodeposition experiments of the charge-transfer complex copper tetracyanoquinodimethane (CuTCNQ...
In this letter, the effect of Al and Ni top electrodes in resistive switching behavior of Al/Yb2O3/T...
Resistive switching characteristics of Ag/SiO2/Pt memory cells with different set current compliance...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
For the applications of resistive random access memory (RRAM), we study the complementary resistive ...
The insertion of a metal layer between an active electrode and a switching layer leads to the format...
In this letter, we investigate bipolar resistive switching of CuTCNQ-based memory cells in which var...
Resistive switching in nonvolatile, two terminal organic memories can be due to the presence of a na...
The generally observed bipolar electrical switching of Cu\CuTCNQ\metal memories (metal=Al,Yb,Ti) bet...
Resistive switching in nonvolatile, two terminal organic memories can be due to the presence of a na...
This paper presents recent progress in resistive oxide memories and their integration into advanced ...
This paper presents recent progress in resistive oxide memories and their integration into advanced ...
In this article, we investigate extensively the bipolar-switching properties of Al2O3-and HfO2-based...
Electrodeposition experiments of the charge-transfer complex copper tetracyanoquinodimethane (CuTCNQ...
In this letter, the effect of Al and Ni top electrodes in resistive switching behavior of Al/Yb2O3/T...
Resistive switching characteristics of Ag/SiO2/Pt memory cells with different set current compliance...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
The memory behavior of Al/Ti/ZrO2:Al2O3/TiN/Si/Al devices is investigated in this work. They are ade...
For the applications of resistive random access memory (RRAM), we study the complementary resistive ...
The insertion of a metal layer between an active electrode and a switching layer leads to the format...