In modern deep scaled CMOS ICs, the process, voltage and temperature (PVT) variations result to a randomized variation of the transistor’s parameters. The variability is becoming so large that, by adapting conventional corner based design methodology, the design margin introduced by variation might over-kill the benefit of scaling. This PhD project aims to exploit the design margin that circuit might experience none or small amount of error, yet delivers qualified output.nrpages: 190status: publishe
The supply voltage to threshold voltage ratio is reduced with each new technology generation. The ga...
Technology scaling improves the energy, performance, and area of the digital circuits. With further ...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
In modern deep scaled CMOS ICs, the process, voltage and temperature (PVT) variations result to a ra...
Digital VLSI IC design and manufacturing margins continue to increase in light of process variabilit...
Process variability, in addition to wide temperature and supply voltage variation ranges, severely d...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
2011-11-22In today’s IC design, one of the key challenges is the increase in power consumption of th...
Successful CMOS process scaling has been the key driving force behind the powerful role played by th...
The demand for richer services, multifunctional portable devices and high data rates can be only env...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Approximate and error tolerant circuits are a radical new approach to trade calculation accuracy for...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
With the shift towards deep submicron (DSM) technologies, the increase in leakage power and the adop...
C1 - Journal Articles RefereedThe project Meeting the Design Challenges of nano-CMOS Electronics (ht...
The supply voltage to threshold voltage ratio is reduced with each new technology generation. The ga...
Technology scaling improves the energy, performance, and area of the digital circuits. With further ...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
In modern deep scaled CMOS ICs, the process, voltage and temperature (PVT) variations result to a ra...
Digital VLSI IC design and manufacturing margins continue to increase in light of process variabilit...
Process variability, in addition to wide temperature and supply voltage variation ranges, severely d...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
2011-11-22In today’s IC design, one of the key challenges is the increase in power consumption of th...
Successful CMOS process scaling has been the key driving force behind the powerful role played by th...
The demand for richer services, multifunctional portable devices and high data rates can be only env...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Approximate and error tolerant circuits are a radical new approach to trade calculation accuracy for...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
With the shift towards deep submicron (DSM) technologies, the increase in leakage power and the adop...
C1 - Journal Articles RefereedThe project Meeting the Design Challenges of nano-CMOS Electronics (ht...
The supply voltage to threshold voltage ratio is reduced with each new technology generation. The ga...
Technology scaling improves the energy, performance, and area of the digital circuits. With further ...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...