Microstructural investigation of Co-P by TEM

The microstructure of electrodeposited Co-P films was investigated using transmission electron microscopy (TEM). The use ofultramicrotomy for sample preparation made it possible to obtain cross sections parallel to the growth direction of the film.Co-P films deposited under constant current conditions are amorphous and no nonuniformity could be identified at a scale ofa few to a few tens of nanometers. This is in contradiction with the often made assumption that Co-P electrodeposited underconstant current conditions has a columnar microstructure. Co-P layers electrodeposited in pulsed current conditions showa clear multilayer structure. © 2004 The Electrochemical Society. All rights reserved.status: publishe