WOS: 000276054200054In this paper we made a study on the effect of films thickness on the electrical conduction properties of nanostructured TiO(2) thin films deposited by d.c. reactive sputtering. The deposition was performed on heated (573 K) glass substrates, using water vapor as reactive gas. The electrical conductivity of the films was investigated in the temperature range 13-320K. The temperature dependence of electrical conductivity between 80 and 320 K indicated that electrical conductivity in the films was controlled by potential barriers caused by depletion of carriers at grain boundaries in the material. Values of grain barrier heights and surface trap density at the grain boundaries were extracted from the high temperature data ...
This paper compares titanium oxide (TiO2) thin films deposited by RF and DC sputtering. Structural c...
Oxide-semiconductor interface quality of high-pressure reactive sputtered (HPRS) TiO2 films annealed...
Nanostructured powders of titanium dioxide anatase nanoplates with dominant highly reactive {0 0 1} ...
Titanium dioxide thin films were obtained by a dc sputtering technique onto heated glass substrates....
Titanium oxide thin films were prepared by reactive magnetron sputtering. The reactive gas pulsing p...
WOS: 000253725400011Electrical conductivity measurements in an undoped titanium dioxide thin film ha...
Thin films of TiO2 were grown on n-type Si substrate by thermal oxidation of Ti films deposited by d...
The influence of the deposition rate of titanium thin films on their microscopic structure has been ...
WOS: 0002937735000390.5 wt% Pd-doped titanium oxide thin films were obtained by dip-coating on silic...
AbstractTitanium oxide (TiOx) thin films were deposited on K9 glass substrates using a pure titanium...
We studied the structural and electrical properties of TiO2 thin films grown by thermal oxidation of...
Rutile-phased TiO2 thin films consist of single layer of nanorod structure and bilayer of nanorod an...
Influences of both substrate temperature, T(s) (similar to 305, 473 K) and oxidation temperature, T(...
The resistive switching mechanism of 20- to 57-nm-thick TiO2 thin films grown by atomic-layer deposi...
Ti-SiO_2 cermet thin films were deposited onto a glass substrate by R. F. sputtering from a Ti-SiO_2...
This paper compares titanium oxide (TiO2) thin films deposited by RF and DC sputtering. Structural c...
Oxide-semiconductor interface quality of high-pressure reactive sputtered (HPRS) TiO2 films annealed...
Nanostructured powders of titanium dioxide anatase nanoplates with dominant highly reactive {0 0 1} ...
Titanium dioxide thin films were obtained by a dc sputtering technique onto heated glass substrates....
Titanium oxide thin films were prepared by reactive magnetron sputtering. The reactive gas pulsing p...
WOS: 000253725400011Electrical conductivity measurements in an undoped titanium dioxide thin film ha...
Thin films of TiO2 were grown on n-type Si substrate by thermal oxidation of Ti films deposited by d...
The influence of the deposition rate of titanium thin films on their microscopic structure has been ...
WOS: 0002937735000390.5 wt% Pd-doped titanium oxide thin films were obtained by dip-coating on silic...
AbstractTitanium oxide (TiOx) thin films were deposited on K9 glass substrates using a pure titanium...
We studied the structural and electrical properties of TiO2 thin films grown by thermal oxidation of...
Rutile-phased TiO2 thin films consist of single layer of nanorod structure and bilayer of nanorod an...
Influences of both substrate temperature, T(s) (similar to 305, 473 K) and oxidation temperature, T(...
The resistive switching mechanism of 20- to 57-nm-thick TiO2 thin films grown by atomic-layer deposi...
Ti-SiO_2 cermet thin films were deposited onto a glass substrate by R. F. sputtering from a Ti-SiO_2...
This paper compares titanium oxide (TiO2) thin films deposited by RF and DC sputtering. Structural c...
Oxide-semiconductor interface quality of high-pressure reactive sputtered (HPRS) TiO2 films annealed...
Nanostructured powders of titanium dioxide anatase nanoplates with dominant highly reactive {0 0 1} ...