Increasing levels of process variability in sub-100nm CMOS design has become a critical concern for performance and power constraint designs. In this paper, we propose a new statistically aware Dual-Vt and sizing optimization that considers both the variability in performance and leakage of a design. While extensive work has been performed in the past on statistical analysis methods, circuit optimization is still largely performed using deterministic methods. We show in this paper that deterministic optimization quickly looses effectiveness for stringent performance and leakage constraints in designs with significant variability. We then propose a statistically aware dual-Vt and sizing algorithm where both delay constraints and sensitivity ...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
Process variability, in addition to wide temperature and supply voltage variation ranges, severely d...
This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence o...
DoctorAggressive technology scaling makes the process variations a significant problem in VLSI desig...
Technology scaling has been the driving force behind the growth of the semiconductor industry over t...
With the increased significance of leakage power and performance variability, the yield of a design ...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract-The growing demand in the multimedia rich applications are motivating the low-power and hig...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
In today’s sub-100nm CMOS technologies, leakage current has become an important part of the total po...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
VLSI design optimization requires evaluation of di#erent solutions, to compare superiority of one ov...
The performance of integrated circuits (IC) is becoming less predictable as technology scales to the...
While technology scaling has enabled the design of complex information systems, uncertainty in the V...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
Process variability, in addition to wide temperature and supply voltage variation ranges, severely d...
This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence o...
DoctorAggressive technology scaling makes the process variations a significant problem in VLSI desig...
Technology scaling has been the driving force behind the growth of the semiconductor industry over t...
With the increased significance of leakage power and performance variability, the yield of a design ...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract-The growing demand in the multimedia rich applications are motivating the low-power and hig...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
In today’s sub-100nm CMOS technologies, leakage current has become an important part of the total po...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
VLSI design optimization requires evaluation of di#erent solutions, to compare superiority of one ov...
The performance of integrated circuits (IC) is becoming less predictable as technology scales to the...
While technology scaling has enabled the design of complex information systems, uncertainty in the V...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
Process variability, in addition to wide temperature and supply voltage variation ranges, severely d...
This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence o...