Implementing logic blocks in an integrated circuit in terms of repeating or regular geometry patterns [6,7] can provide significant advantages in terms of manufacturability and design cost [2]. Various forms of gate and logic arrays have been recently proposed that can offer such pattern regularity to reduce design risk and costs [2,4,9,11,12]. In this paper, we propose a full-maskset design methodology which provides the same physical design coherence as a configurable array, but with area and other design benefits comparable to standard cell ASICs. This methodology is based on a set of simple logic primitives that are mapped to a set of logic bricks that are defined by a restrictive set of RET(Resolution Enhancement Technique)-friendly ge...
Each reduction of the technology node has, along with improvements in IC fabricationtechnology, been...
Abstract—As semiconductor technology advances into the nanoscale era, optical effects such as channe...
This paper presents a novel yield model for integrated circuits manufacturing, considering lithograp...
Driven by the economics of design and manufacturing nanoscale integrated circuits, an emphasis is be...
A recently proposed “soft ” eFPGA methodology was used to create small amounts of programmable logic...
The layout strategies of standard cells with regularly-placed contacts and gates are studied. The re...
Systematic and statistical variability in digital design is becoming increasingly important, and thi...
This paper presents a logic and physical synthesis to achieve logic and geometric regularity. The lo...
The functional component for an FPGA is the logic element which enables it to adapt to various hardw...
Layout regularity will be mandatory for future CMOS technologies to mitigate manufacturability issue...
In the deep submicron (DSM) era, design rules have become increasingly more stringent and have favo...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowi...
In nowadays nanometer technology nodes, the semiconductor industry has to deal with the new challeng...
ABSTRACT The 20nm generation for logic will be challenging for optical lithography, with a contacted...
Each reduction of the technology node has, along with improvements in IC fabricationtechnology, been...
Abstract—As semiconductor technology advances into the nanoscale era, optical effects such as channe...
This paper presents a novel yield model for integrated circuits manufacturing, considering lithograp...
Driven by the economics of design and manufacturing nanoscale integrated circuits, an emphasis is be...
A recently proposed “soft ” eFPGA methodology was used to create small amounts of programmable logic...
The layout strategies of standard cells with regularly-placed contacts and gates are studied. The re...
Systematic and statistical variability in digital design is becoming increasingly important, and thi...
This paper presents a logic and physical synthesis to achieve logic and geometric regularity. The lo...
The functional component for an FPGA is the logic element which enables it to adapt to various hardw...
Layout regularity will be mandatory for future CMOS technologies to mitigate manufacturability issue...
In the deep submicron (DSM) era, design rules have become increasingly more stringent and have favo...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowi...
In nowadays nanometer technology nodes, the semiconductor industry has to deal with the new challeng...
ABSTRACT The 20nm generation for logic will be challenging for optical lithography, with a contacted...
Each reduction of the technology node has, along with improvements in IC fabricationtechnology, been...
Abstract—As semiconductor technology advances into the nanoscale era, optical effects such as channe...
This paper presents a novel yield model for integrated circuits manufacturing, considering lithograp...