Add to ORKGThe method of neutral atom lithography allows to transfer a 2D intensity modulation of an atomic beam imposed by an inhomogeneous light field to a substrate. The complexity of the pattern depends on the properties of the light field constructed from the superposition of multiple laser beams. For the design of suitable light fields we present a mathematical model with a corresponding numerical simulation of the so called inverse problem. Furthermore, details of an experiment carried out with a holographically reconstructed light field are discussed
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matte...
Abstract—We present an overview of our progress towards using optical fields as ‘light masks ’ for m...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant l...
With a two-dimensional (2D) optical mask at lambda=1083 nm, nanoscale patterns are created for the f...
Neutral atoms have been used to write two dimensional structures on silicon substrates. Two differen...
A technique based on coherent control for the optical manipulation of deposition patterns in nanofab...
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme...
Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams int...
We have created periodic nanoscale structures in a gold substrate with a lithography process using m...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matte...
Abstract—We present an overview of our progress towards using optical fields as ‘light masks ’ for m...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant l...
With a two-dimensional (2D) optical mask at lambda=1083 nm, nanoscale patterns are created for the f...
Neutral atoms have been used to write two dimensional structures on silicon substrates. Two differen...
A technique based on coherent control for the optical manipulation of deposition patterns in nanofab...
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme...
Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams int...
We have created periodic nanoscale structures in a gold substrate with a lithography process using m...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matte...