Neutral transport in the high density, low temperature plasma regime is examined using the degas 2 Monte Carlo neutral transport code. Degas 2 is shown to agree with an analytic fluid neutral model valid in this regime as long as the grid cell spacing is less than twice the neutral mean-free path. Using new atomic physics data provided by the collisional radiative code cramd, degas 2 is applied to a detached Alcator C-Mod discharge. A model plasma with electron temperature ∼ 1 eV along detached flux tubes, between the target and the ionization front, is used to demonstrate that recombination is essential to matching the experimental data. With the cramd data, ∼ 20 % of the total recombination is due to molecular activated recombination
Detachment is achieved in Magnum-PSI by increasing the neutral background pressure in the target cha...
Recently, much effort has been dedicated to understanding the bifurcation involved in the transition...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...
Neutral transport in the high density, low temperature plasma regime is examined using the DEGAS 2 M...
A series of experiments on the effect of divertor baffling on the Alcator C-Mod tokamak provides str...
The transport of neutral atoms and molecules in the edge and divertor regions of fusion experiments ...
A Monte Carlo neutral transport routine, based on DEGAS2, has been coupled to the guiding center ion...
The central theme of this dissertation is to explore the impact of neutral depletion and coupling be...
A Monte Carlo neutral transport routine, based on DEGAS2, has been coupled to the guiding center ion...
Visible imaging of gas puffs has been used on the Alcator C-Mod tokamak to characterize edge plasma ...
Using the coupled fluid plasma and Monte Carlo neutral transport code, B2-EIRENE, we simulate and an...
Simulations of high-density deuterium plasmas in a lower single-null magnetic configuration based on...
The components of the neutral- and plasma-surface interaction model used in the Monte Carlo neutral ...
A model for steady state neutral atom transport in a finite thickness, one dimensional plasma slab w...
Transport of neutral particles in non-axisymmetric anchor region of the GAMMA 10 tandem mirror is de...
Detachment is achieved in Magnum-PSI by increasing the neutral background pressure in the target cha...
Recently, much effort has been dedicated to understanding the bifurcation involved in the transition...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...
Neutral transport in the high density, low temperature plasma regime is examined using the DEGAS 2 M...
A series of experiments on the effect of divertor baffling on the Alcator C-Mod tokamak provides str...
The transport of neutral atoms and molecules in the edge and divertor regions of fusion experiments ...
A Monte Carlo neutral transport routine, based on DEGAS2, has been coupled to the guiding center ion...
The central theme of this dissertation is to explore the impact of neutral depletion and coupling be...
A Monte Carlo neutral transport routine, based on DEGAS2, has been coupled to the guiding center ion...
Visible imaging of gas puffs has been used on the Alcator C-Mod tokamak to characterize edge plasma ...
Using the coupled fluid plasma and Monte Carlo neutral transport code, B2-EIRENE, we simulate and an...
Simulations of high-density deuterium plasmas in a lower single-null magnetic configuration based on...
The components of the neutral- and plasma-surface interaction model used in the Monte Carlo neutral ...
A model for steady state neutral atom transport in a finite thickness, one dimensional plasma slab w...
Transport of neutral particles in non-axisymmetric anchor region of the GAMMA 10 tandem mirror is de...
Detachment is achieved in Magnum-PSI by increasing the neutral background pressure in the target cha...
Recently, much effort has been dedicated to understanding the bifurcation involved in the transition...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...