Abstract — Process variations cause design performance to become unpredictable in deep sub-micron technologies. Several statistical techniques (timing analysis, gate-sizing, buffer insertion) have been proposed to counter these variations during the optimization phase of the design flow to get better timing yields. Another interesting approach to improve timing yield is post-silicon tunable (PST) clock-tree. However, gate sizing and PST clock tree management have not been integrated together into a single framework for better optimization. In this work, we propose such an integrated framework that performs simultaneous statistical gatesizing in presence of PST clock-tree buffers for minimizing binningyield loss (BYL) and tunability costs by...
Gate sizing is one of the most flexible and powerful methods available for the timing and power opti...
Process and device scaling in late-CMOS technologies highlight leakage power as a critical challenge...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Process variations result in a considerable spread in the frequency of the fabricated chips. In high...
Abstract—In this paper, we propose a statistical gate sizing ap-proach to maximize the timing yield ...
Abstract—As technology scales into the sub-90nm domain, manufacturing variations become an increasin...
Variability of circuit performance is becoming a very im-portant issue for ultra-deep sub-micron tec...
As technology scaling enters the nanometer regime, design of large scale ICs gets more challenging d...
The move to deep submicron processes has brought about new problems that designers must contend with...
Timing margin (slack) needs to be carefully managed to ensure a satisfactory timing yield. We propos...
textLogic optimization and clock network optimization for power, performance and area trade-off have...
Technology scaling has increased the transistor\u27s susceptibility to process variations in nanomet...
Increasing levels of process variability in sub-100nm CMOS design has become a critical concern for ...
In this paper we have applied statistical sizing in an industrial setting. Efficient implementation ...
Gate sizing is one of the most flexible and powerful methods available for the timing and power opti...
Process and device scaling in late-CMOS technologies highlight leakage power as a critical challenge...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Process variations result in a considerable spread in the frequency of the fabricated chips. In high...
Abstract—In this paper, we propose a statistical gate sizing ap-proach to maximize the timing yield ...
Abstract—As technology scales into the sub-90nm domain, manufacturing variations become an increasin...
Variability of circuit performance is becoming a very im-portant issue for ultra-deep sub-micron tec...
As technology scaling enters the nanometer regime, design of large scale ICs gets more challenging d...
The move to deep submicron processes has brought about new problems that designers must contend with...
Timing margin (slack) needs to be carefully managed to ensure a satisfactory timing yield. We propos...
textLogic optimization and clock network optimization for power, performance and area trade-off have...
Technology scaling has increased the transistor\u27s susceptibility to process variations in nanomet...
Increasing levels of process variability in sub-100nm CMOS design has become a critical concern for ...
In this paper we have applied statistical sizing in an industrial setting. Efficient implementation ...
Gate sizing is one of the most flexible and powerful methods available for the timing and power opti...
Process and device scaling in late-CMOS technologies highlight leakage power as a critical challenge...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...