As processor clock frequencies become faster, architecture-level design is becoming increasingly limited by factors such as on-chip variation. Parameter variation occurs in integrated circuits as the result of a variety of manufacturing and physical factors. In this paper, we examine the degree to which there is parameter variation on an FPGA. Data were gathered from a combinatorial logic device instantiated on the FPGA. We analyze these data with respect to variance, and provide a confidence interval for the variance and standard deviation.
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process varia...
The mitigation of process variability becomes paramount as chip fabrication advances deeper into the...
As integrated circuits are scaled down it becomes dif-ficult to maintain uniformity in process param...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
Abstract—Increased variation in CMOS processes due to scaling results in greater reliance on accurat...
Process variability is a challenging fabrication issue impacting, mainly, the reliability and perfor...
Abstract — We have fabricated an LUT-based FPGA device with functionalities measuring within-die var...
Increased variation in CMOS processes due to scaling results in greater reliance on accurate variati...
We report the design and characterization of a circuit technique to measure the on-chip delay of a...
Integrated Circuit (IC) designers have always faced the problem of small deviations in parameters of...
Electronic monitoring utilizing process-specific Ring Oscillators (RO) is explored as a means of ide...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process varia...
The mitigation of process variability becomes paramount as chip fabrication advances deeper into the...
As integrated circuits are scaled down it becomes dif-ficult to maintain uniformity in process param...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
Abstract—Increased variation in CMOS processes due to scaling results in greater reliance on accurat...
Process variability is a challenging fabrication issue impacting, mainly, the reliability and perfor...
Abstract — We have fabricated an LUT-based FPGA device with functionalities measuring within-die var...
Increased variation in CMOS processes due to scaling results in greater reliance on accurate variati...
We report the design and characterization of a circuit technique to measure the on-chip delay of a...
Integrated Circuit (IC) designers have always faced the problem of small deviations in parameters of...
Electronic monitoring utilizing process-specific Ring Oscillators (RO) is explored as a means of ide...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process varia...