As silicon technologies move into the nanometer regime, transistor reliability is expected to wane as devices become subject to extreme process variation, particle-induced transient errors, and transistor wear-out. Unless these challenges are addressed, computer vendors can expect low yields and short mean-times-to-failure. In this article, we examine the challenges of designing complex computing systems in the presence of transient and permanent faults. We select one small aspect of a typical chip multiprocessor (CMP) system to study in detail, a single CMP router switch. Our goal is to design a BulletProof CMP switch architecture capable of tolerating significant levels of various types of defects. We first assess the vulnerability of the...
This paper addresses the fault tolerance issues concerning the input-output ports (IOPs) of future m...
With continued CMOS scaling, future shipped hardware will be increasingly vulnerable to in-the-field...
講演日: 平成25年6月26日講演場所: 情報科学研究科大講義室L1Relentless scaling of silicon fabrication technology coupled with ...
As silicon technologies move into the nanometer regime, transistor reliability is expected to wane a...
As silicon technologies move into the nanometer regime, transistor reliability is expected to wane a...
To meet an insatiable consumer demand for greater performance at less power, silicon technology has ...
It is widely accepted that transient failures will appear more frequently in chips designed in the n...
As silicon continues to scale, transistor reliability is becoming a major concern. At the same time,...
abstract: Reducing device dimensions, increasing transistor densities, and smaller timing windows, e...
Relentless CMOS scaling coupled with lower design tolerances is making ICs increasingly susceptible ...
Moore's Law scaling is continuing to yield even higher transistor density with each succeeding proce...
Reliability of logic circuits is emerging as an important concern that may limit the benefits of con...
Moore's Law scaling continues to yield higher transistor density with each succeeding process genera...
Abstract—Reducing device dimensions, increasing transistor densities, and smaller timing windows, ex...
Deep submicron technologies continue to develop according to Moore’s law allowing hundreds of proces...
This paper addresses the fault tolerance issues concerning the input-output ports (IOPs) of future m...
With continued CMOS scaling, future shipped hardware will be increasingly vulnerable to in-the-field...
講演日: 平成25年6月26日講演場所: 情報科学研究科大講義室L1Relentless scaling of silicon fabrication technology coupled with ...
As silicon technologies move into the nanometer regime, transistor reliability is expected to wane a...
As silicon technologies move into the nanometer regime, transistor reliability is expected to wane a...
To meet an insatiable consumer demand for greater performance at less power, silicon technology has ...
It is widely accepted that transient failures will appear more frequently in chips designed in the n...
As silicon continues to scale, transistor reliability is becoming a major concern. At the same time,...
abstract: Reducing device dimensions, increasing transistor densities, and smaller timing windows, e...
Relentless CMOS scaling coupled with lower design tolerances is making ICs increasingly susceptible ...
Moore's Law scaling is continuing to yield even higher transistor density with each succeeding proce...
Reliability of logic circuits is emerging as an important concern that may limit the benefits of con...
Moore's Law scaling continues to yield higher transistor density with each succeeding process genera...
Abstract—Reducing device dimensions, increasing transistor densities, and smaller timing windows, ex...
Deep submicron technologies continue to develop according to Moore’s law allowing hundreds of proces...
This paper addresses the fault tolerance issues concerning the input-output ports (IOPs) of future m...
With continued CMOS scaling, future shipped hardware will be increasingly vulnerable to in-the-field...
講演日: 平成25年6月26日講演場所: 情報科学研究科大講義室L1Relentless scaling of silicon fabrication technology coupled with ...