Simulationof Sputteringfputteri

Both binary-collision and molecular-dynamics simulationsof sputtering properties usually are carried out using perfg2WP smooth targets. However, in actual sputtering experiments the target topography most oft2 is not smooth. In this molecular-dynamics simulation study we investigate the e#ect that a simple step irregularity on thesurfW] of a Cu(1 0 0) target has on sputtering properties such as yields, sputtered-atom energy distributions, and sputtered-atom angular distributions