The present invention involves the use of organocalcium precursors for the chemical vapor deposition of thin CaF.sub.2 films under exceptionally mild conditions. This method is based on utilizing an organocalcium compound and a source of fluorine in a chemical vapor deposition reaction to form CaF.sub.2.Board of Regents, University of Texas Syste
A review is presented of early and recent advances in the metal-organic chemical vapor deposition (M...
An organometallic precursor, (hexafluoroacetyl-acetonate, hfac)Cu-(1)(vinylcyclohexane, VCH) was stu...
SIGLEAvailable from British Library Document Supply Centre- DSC:DX182629 / BLDSC - British Library D...
The present invention involves the use of organocalcium precursors for the chemical vapor deposition...
Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic lay...
Calcium fluoride represents one of the most efficient hosts for up-conversion or down-conversion emi...
An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R)....
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
We present a procedure for growing thin films of an organic polyamid material based on a cyclic repe...
textWith the growing demand for miniaturization of devices and for new materials with useful propert...
A method for forming a fluorinated oxostannate film involves vaporizing a volatile fluorinated alkyl...
CaF2, SrF2, and ZnF2 thin films have been deposited on glass substrates for the first time using ato...
International audienceConventional and Pulsed Liquid Injection MOCVD processes (C-MOCVD and PLI-MOCV...
A low temperature metalorganic chemical vapor deposition process has been developed for the growth o...
The tremendous expansion of metal-organic chemical vapor deposition process (MOCVD) is accounted for...
A review is presented of early and recent advances in the metal-organic chemical vapor deposition (M...
An organometallic precursor, (hexafluoroacetyl-acetonate, hfac)Cu-(1)(vinylcyclohexane, VCH) was stu...
SIGLEAvailable from British Library Document Supply Centre- DSC:DX182629 / BLDSC - British Library D...
The present invention involves the use of organocalcium precursors for the chemical vapor deposition...
Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic lay...
Calcium fluoride represents one of the most efficient hosts for up-conversion or down-conversion emi...
An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R)....
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
We present a procedure for growing thin films of an organic polyamid material based on a cyclic repe...
textWith the growing demand for miniaturization of devices and for new materials with useful propert...
A method for forming a fluorinated oxostannate film involves vaporizing a volatile fluorinated alkyl...
CaF2, SrF2, and ZnF2 thin films have been deposited on glass substrates for the first time using ato...
International audienceConventional and Pulsed Liquid Injection MOCVD processes (C-MOCVD and PLI-MOCV...
A low temperature metalorganic chemical vapor deposition process has been developed for the growth o...
The tremendous expansion of metal-organic chemical vapor deposition process (MOCVD) is accounted for...
A review is presented of early and recent advances in the metal-organic chemical vapor deposition (M...
An organometallic precursor, (hexafluoroacetyl-acetonate, hfac)Cu-(1)(vinylcyclohexane, VCH) was stu...
SIGLEAvailable from British Library Document Supply Centre- DSC:DX182629 / BLDSC - British Library D...
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