Comparative study of photo-induced variations of X-ray diffraction and refractive index in photo-thermo-refractive glass

Spontaneous and photo-induced crystallization have been investigated in fluorinated silicate glass by means of X-ray diffraction and optical interferometry. This glass is a photo-sensitive material for high-efficiency phase volume hologram recording. Variations of a refractive index in this glass are controlled by UV irradiation followed by a thermal development which is photo-thermo-refractive (PTR) process. A method of discrimination of weak narrow crystalline lines from a broad diffractive pattern of a vitreous material was developed, and quantitative measurements of small concentrations of crystalline phase in glass matrix were performed. The sensitivity of the method was about 0.01 wt% of crystalline phase of NaF in a silicate glass. This crystalline phase with concentration below 0.1 wt% was detected even in a highly transparent PTR glass with a modified refractive index produced by PTR processing. A correlation between the intensity of X-ray diffraction peaks of NaF and the induced refractive index was found in equally developed PTR glass samples exposed to different dosages of UV radiation. (C) 2003 Elsevier B.V. All rights reserved