Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target mate...
Extreme ultraviolet (EUV) nanolithography relies on CO2-lasers to drive EUV-emitting tin plasma at 1...
A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength....
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
Metallic solutions at room temperature used a laser point source target droplets. Using the target m...
Metallic solutions at room temperature used a laser point source target droplets. Using the target m...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The sourc...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet (EUV) light for state-...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithogra...
The XUV band, a region of light spanning the wavelength range of 5 - 200 nm, is located between the ...
Advances in X-Ray/EUV Optics and Components V, 2–3 August 2010 San Diego, California, United State...
Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for ap...
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target mate...
Extreme ultraviolet (EUV) nanolithography relies on CO2-lasers to drive EUV-emitting tin plasma at 1...
A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength....
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
Metallic solutions at room temperature used a laser point source target droplets. Using the target m...
Metallic solutions at room temperature used a laser point source target droplets. Using the target m...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The sourc...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet (EUV) light for state-...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithogra...
The XUV band, a region of light spanning the wavelength range of 5 - 200 nm, is located between the ...
Advances in X-Ray/EUV Optics and Components V, 2–3 August 2010 San Diego, California, United State...
Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for ap...
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target mate...
Extreme ultraviolet (EUV) nanolithography relies on CO2-lasers to drive EUV-emitting tin plasma at 1...
A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength....