科研費報告書収録論文(課題番号:13305010・基盤研究(A)(2) ・H13～H15/研究代表者:江刺, 正喜/ナノメートルの精度で動く分布型マイクロ・ナノマシン
We constructed a scanning tunneling microscope aligned field emission (SAFE) source by using silicon...
Because of the rapid development of microfabricating and micromachining semiconductor devices, the n...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
科研費報告書収録論文(課題番号:13305010・基盤研究(A)(2) ・H13～H15/研究代表者:江刺, 正喜/ナノメートルの精度で動く分布型マイクロ・ナノマシン
The development of a multi-electron beam system is described which is dedicated for electron beam in...
A eld emitter array (FEA) with a ve-stacked gate electrode, that is, a quintuple-gated FEA with a fo...
Out-of-plane focusing is essential for electron beam collimation in gated field emission sources. Th...
For multielectron beam systems with a single electron source, the outside beams need to be collimate...
Lithography techniques based on electron-beam-induced processes are inherently slow compared to ligh...
Emerging experiments and applications in electron microscopy, holography, and diffraction benefit fr...
The fabrication of double-gate metallic field emitter arrays with large collimation gate apertures a...
For multielectron beam systems with a single electron source, the outside beams need to be collimate...
[[abstract]]A microbowtie array critical to a newly developed optical probe is studied. The optical ...
Charged particle beam actuators such as particle accelerators and particle beam optics systems have ...
We constructed a scanning tunneling microscope aligned field emission (SAFE) source by using silicon...
Because of the rapid development of microfabricating and micromachining semiconductor devices, the n...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
科研費報告書収録論文(課題番号:13305010・基盤研究(A)(2) ・H13～H15/研究代表者:江刺, 正喜/ナノメートルの精度で動く分布型マイクロ・ナノマシン
The development of a multi-electron beam system is described which is dedicated for electron beam in...
A eld emitter array (FEA) with a ve-stacked gate electrode, that is, a quintuple-gated FEA with a fo...
Out-of-plane focusing is essential for electron beam collimation in gated field emission sources. Th...
For multielectron beam systems with a single electron source, the outside beams need to be collimate...
Lithography techniques based on electron-beam-induced processes are inherently slow compared to ligh...
Emerging experiments and applications in electron microscopy, holography, and diffraction benefit fr...
The fabrication of double-gate metallic field emitter arrays with large collimation gate apertures a...
For multielectron beam systems with a single electron source, the outside beams need to be collimate...
[[abstract]]A microbowtie array critical to a newly developed optical probe is studied. The optical ...
Charged particle beam actuators such as particle accelerators and particle beam optics systems have ...
We constructed a scanning tunneling microscope aligned field emission (SAFE) source by using silicon...
Because of the rapid development of microfabricating and micromachining semiconductor devices, the n...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
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