Magnetic Properties of Amorphous CoNbZr Films Sputter-deposited in Magnetic Field

In an effort to improve soft magnetic properties of amorphous CoNbZr films at high frequency, we have investigated the effect of both magnetic field and sputtering deposition conditions on magnetic properties of the films. A uniform magnetic field from a pair of permanent magnets was applied during film deposition. The magnetic field results in the in-plane uniaxial magnetic anisotropy in the films. Permeability(μ) of the films is dependent on the intensity of an applied field, and is independent of frequency more than 10 MHz. Argon(Ar) gas pressure and RF input power during film preparation can controll the magnitude of anisotropy and permeability. These films are consistent with the equation of μ=Bs/Hk : Bs : Saturation induction, Hk : anisotropy field