Diffusion Parameters Dependent on Atomic Transport Mechanism for Self-diffusion in Copper(II. Radiochemistry)

The self-diffusion coefficients of Cu in copper single crystals in the temperature range from 980 K to 1351 K were determined by the serial sectioning method using the self-made tracer ^Cu. The temperature dependence is expressed by D = 2.62×10^ exp(-199 kJmol^/RT) m^2/s. A slight curvature was observed in the Arrhenius plot of the self-diffusion coefficients near the melting of copper. The result was analyzed using the monovacancy-divacancy model, showing that the contribution of divacancy to the self-diffusion in copper at high temperature range near the melting of copper cannot be ignored. The self-diffusion coefficients in the present work were compared with the other copper self-diffusion works for volume diffusion, grain boundary diffusion, surface diffusion, diffusion in nanocrystal and liquid of copper