This paper presents a fully physics-based variability analysis of single-fin double-gate Metal Oxide Semiconductor FET (MOSFET) AC parameters, without resorting to any approximated quasi-static analysis based on the variations of theDCdrain current or charge.Variations of theACparameters have been investigated as a function of all the relevant geometrical and physical parameters, with emphasis on the ones affecting the device parasitics, especially important for high-frequency analog applications. A numerically efficient Green's function technique is applied to reduce the simulation time to a few percent of the time required for standard Monte Carlo–based variability analysis. The Green's function approach especially allows for a d...
This paper presents a novel table-based approach for efficient statistical analysis of Finfield effe...
A comprehensive statistical variability simulation study of a 10nm gate length FinFET device is pres...
This paper presents a comprehensive simulation study of the interactions between long-range process ...
FinFETs operated with varying bias, and in particular with Short-circuited Gates (SG) or Independent...
This paper presents the physics-based variability analysis of multi-fin double-gate (DG) MOSFETs, re...
A nearly insatiable appetite for the latest electronic device enables the electronic technology sect...
This paper presents a new approach to extract the temperature-dependent sensitivity of electron devi...
In this paper we show that innovative physics-based simulations can be used for a comprehensive anal...
session: nanoelectronic devicesInternational audienceWe expanded our analytical compact model for th...
The Green’s Function based TCAD device variability analysis is extended to allow for temperature-dep...
Metal gate granularity (MGG)-induced threshold voltage variability is the dominant source of variabi...
A simple device-level characterization approach to quantitatively evaluate the impacts of different ...
Metal gate technology is a key enabler for continued transistor scaling and is essential to proper o...
none3noWhile traditional scaling used to be accompanied by an improvement in device performance, thi...
Estimation of threshold voltage V-T variability for NWFETs has been computationally expensive due to...
This paper presents a novel table-based approach for efficient statistical analysis of Finfield effe...
A comprehensive statistical variability simulation study of a 10nm gate length FinFET device is pres...
This paper presents a comprehensive simulation study of the interactions between long-range process ...
FinFETs operated with varying bias, and in particular with Short-circuited Gates (SG) or Independent...
This paper presents the physics-based variability analysis of multi-fin double-gate (DG) MOSFETs, re...
A nearly insatiable appetite for the latest electronic device enables the electronic technology sect...
This paper presents a new approach to extract the temperature-dependent sensitivity of electron devi...
In this paper we show that innovative physics-based simulations can be used for a comprehensive anal...
session: nanoelectronic devicesInternational audienceWe expanded our analytical compact model for th...
The Green’s Function based TCAD device variability analysis is extended to allow for temperature-dep...
Metal gate granularity (MGG)-induced threshold voltage variability is the dominant source of variabi...
A simple device-level characterization approach to quantitatively evaluate the impacts of different ...
Metal gate technology is a key enabler for continued transistor scaling and is essential to proper o...
none3noWhile traditional scaling used to be accompanied by an improvement in device performance, thi...
Estimation of threshold voltage V-T variability for NWFETs has been computationally expensive due to...
This paper presents a novel table-based approach for efficient statistical analysis of Finfield effe...
A comprehensive statistical variability simulation study of a 10nm gate length FinFET device is pres...
This paper presents a comprehensive simulation study of the interactions between long-range process ...