埋め浴みチャネルMOSキャパシタの高周波C-V特性

High-frequency capacitance-voltage (C-V) characteristics of a buried-channel, MOS capacitor have been analyzed. High-frequency capacitance of a buried-channel MOS capacitor that has a player at the surface of n substrate reaches a minimum value and then slightly increases to saturate in the inversion region. Poisson equation is solved numerically including hole redistribution effect by the gate-voltage change for the measurement signal. The result quantitatively explains the existence of capacitance minimum which is peculiar to a buried-channel MOS capacitor