Tantalum (Ta) is a metal that is highly prized for its applications in a variety of industries, including the microelectronics industry, where it is largely used in thin film modifications in order to achieve various electronic, magnetic and structural capabilities in solid-state devices. Ta frequently forms metastable phases, including the well-known ß-phase, during the preparation of thin Ta films by standard film deposition methods such as sputtering and electro-deposition. In order to gain insight into Ta metastable phase formation, the Bain transformation mechanism is studied for Ta and the neighboring body centered cubic (bcc) transition metals in Groups 5 and 6 of the Periodic Table, resulting in the prediction of hypothetical body c...
Sputtered tantalum can be used as an effective corrosion resistant barrier if the coating is continu...
In $\textit{situ}$ resistance measurements during the growth of ion beam sputter deposited tantalum ...
We describe a combinatorial experiment investigating the Ta–Al–C material system, conducted with the...
Tantalum (Ta) is a metal that is highly prized for its applications in a variety of industries, incl...
Thin metal films are widely used in industry, and often show strikingly different behavior than the ...
Thin tantalum films were prepared on oxidized silicon substrates in the metastable b phase using an ...
Sputtered tantalum forms two phases - α and β. The α and β phases have distinctly different crystall...
The purpose of this research was to investigate the effects of ion bombardment on the crystallograph...
International audienceWe comparatively study the elastic properties of the two existing polytypes of...
Tantalum coatings are of particular interest today as promising candidates to replace potentially ha...
Thin tantalum films were prepared on oxidized silicon substrates in the metastable β phase using an ...
Ultra-refined microstructures of both tantalum (Ta) and vanadium (V) are produced using electron-bea...
Sputter deposited tantalum (Ta) thin films can form in 2 phases: the metastable tetragonal phase ([b...
Tantalum (Ta) is a metal with good properties to act as a diffusion barrier material in computer chi...
Epitaxial growth is an important technique for the fabrication of film structures with good crystall...
Sputtered tantalum can be used as an effective corrosion resistant barrier if the coating is continu...
In $\textit{situ}$ resistance measurements during the growth of ion beam sputter deposited tantalum ...
We describe a combinatorial experiment investigating the Ta–Al–C material system, conducted with the...
Tantalum (Ta) is a metal that is highly prized for its applications in a variety of industries, incl...
Thin metal films are widely used in industry, and often show strikingly different behavior than the ...
Thin tantalum films were prepared on oxidized silicon substrates in the metastable b phase using an ...
Sputtered tantalum forms two phases - α and β. The α and β phases have distinctly different crystall...
The purpose of this research was to investigate the effects of ion bombardment on the crystallograph...
International audienceWe comparatively study the elastic properties of the two existing polytypes of...
Tantalum coatings are of particular interest today as promising candidates to replace potentially ha...
Thin tantalum films were prepared on oxidized silicon substrates in the metastable β phase using an ...
Ultra-refined microstructures of both tantalum (Ta) and vanadium (V) are produced using electron-bea...
Sputter deposited tantalum (Ta) thin films can form in 2 phases: the metastable tetragonal phase ([b...
Tantalum (Ta) is a metal with good properties to act as a diffusion barrier material in computer chi...
Epitaxial growth is an important technique for the fabrication of film structures with good crystall...
Sputtered tantalum can be used as an effective corrosion resistant barrier if the coating is continu...
In $\textit{situ}$ resistance measurements during the growth of ion beam sputter deposited tantalum ...
We describe a combinatorial experiment investigating the Ta–Al–C material system, conducted with the...