The ultraviolet and visible spectra of plasmas produced by N_2-laser radiation focused onto a copper target in air and in vacuum have been recorded photographically. The nitrogen laser beam (α = 337 nm) had a maximum energy density of 1.1 J/cm^2, the pulse duration was 6 ns, and the repetition rate 0.2 Hz. The measured electron temperature was 15000 K (±30%) in air and 13000 K (±50%) in vacuum and the electron densities were 6.5×10^17 cm^-3 (±60%) and 3.0×10^17 cm^-3 (±60%), respectively. The irradiated surface in air and in vacuum was studied employing a metallographic microscope. In vacuum, the droplets were created and expulsed at the crater edges. Their formation is explained by the hydrodynamical model. They were formed in a time inter...
Za promatranje interakcije nanosekundnog laserskog ultraljubičastog snopa s metalnim površinama kori...
In this paper, we investigate a new method to control the plasma electron number density of copper m...
Plasma splashing from Al and Cu target materials and the growth of thin films on Cu and Al, respecti...
The ultraviolet and visible spectra of plasmas produced by N_2-laser radiation focused onto a copper...
The ultraviolet and visible spectra of plasmas produced by N2-laser radiation focused onto a copper ...
A pulsed ns IR laser at about 1010 W/cm2 intensity is employed to irradiate a Cu target placed in a ...
Interaction of a transversely excited atmospheric (TEA) CO2 laser with rough copper surface, at redu...
Monocrystalline silicon target was irradiated with a nitrogen laser beam (alfa = 337 nm, maximum ene...
The use of copper vapour lasers for laser ablation in laser materials processing applications is stu...
Spatially resolved, time-integrated optical emission spectroscopy was applied for investigation of c...
To study the solid Cu ablation in vacuum, two different laser sources operating at 1064 and 308 nm w...
Solid titanium target was irradiated with a N_2 laser beam of a maximal energy density of 1.1 J/cm^2...
International audienceThe aim of this work is to present a comprehensive numerical model for the UV ...
New developments are reviewed concerning the surface nitr'ioation of lx and Ti Dy Doth pulsed and ...
Plasma produced by a 355 nm pulsed Nd:YAG laser with a pulse duration of 6 ns focussed onto a copper...
Za promatranje interakcije nanosekundnog laserskog ultraljubičastog snopa s metalnim površinama kori...
In this paper, we investigate a new method to control the plasma electron number density of copper m...
Plasma splashing from Al and Cu target materials and the growth of thin films on Cu and Al, respecti...
The ultraviolet and visible spectra of plasmas produced by N_2-laser radiation focused onto a copper...
The ultraviolet and visible spectra of plasmas produced by N2-laser radiation focused onto a copper ...
A pulsed ns IR laser at about 1010 W/cm2 intensity is employed to irradiate a Cu target placed in a ...
Interaction of a transversely excited atmospheric (TEA) CO2 laser with rough copper surface, at redu...
Monocrystalline silicon target was irradiated with a nitrogen laser beam (alfa = 337 nm, maximum ene...
The use of copper vapour lasers for laser ablation in laser materials processing applications is stu...
Spatially resolved, time-integrated optical emission spectroscopy was applied for investigation of c...
To study the solid Cu ablation in vacuum, two different laser sources operating at 1064 and 308 nm w...
Solid titanium target was irradiated with a N_2 laser beam of a maximal energy density of 1.1 J/cm^2...
International audienceThe aim of this work is to present a comprehensive numerical model for the UV ...
New developments are reviewed concerning the surface nitr'ioation of lx and Ti Dy Doth pulsed and ...
Plasma produced by a 355 nm pulsed Nd:YAG laser with a pulse duration of 6 ns focussed onto a copper...
Za promatranje interakcije nanosekundnog laserskog ultraljubičastog snopa s metalnim površinama kori...
In this paper, we investigate a new method to control the plasma electron number density of copper m...
Plasma splashing from Al and Cu target materials and the growth of thin films on Cu and Al, respecti...