Add to ORKGThe proposed paper investigates the effects of ultra-pure water on DUV photoresist used in 193 nm immersion lithography. Microlithography is the key technology that is pacing Moore’s Law. With critical transistor features reaching the 45nm device node, the development for new techniques in optical lithography are well underway. Large investments have been made into the Next Generation Lithography (NGL) technology development such as VUV (vacuum ultraviolet) and EUV (extreme ultraviolet) projection lithography. However, an extension of optical imaging at 193 nm deep ultraviolet (DUV) to immersion lithography at the same wavelength offers considerable potential for it to be used as a next step in production, postponing the introduction of EUV...
textThe semiconductor industry is continually challenged to maintain the trend identified in 1965 b...
Miniaturization has become the key word in microelectronics. Indeed, manufacturers aim at shrinkingd...
In the past 50 years, photolithography has enable continuous scaling down of microelectronic devices...
The proposed paper investigates the effects of ultra-pure water on DUV photoresist used in 193 nm im...
It is possible to extend optical lithography by using immersion imaging methods. Historically, the a...
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of...
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of...
Immersion lithography has emerged as the next technology to achieve the resolution improvement need...
Advances in the semiconductor industry are mainly driven by improvements in optical lithography tech...
Immersion lithography has emerged as the next technology to achieve the resolution improvement need...
Society in the XXIst century is significantly impacted by the widespread use of electronic devices, ...
textImmersion lithography has emerged as the next technology to achieve the resolution improvement ...
textImmersion lithography has emerged as the next technology to achieve the resolution improvement ...
For the next-generation immersion lithography technology, there is a growing interest in the immersi...
As an emerging technique, immersion lithography offers the capability of reducing critical dimension...
textThe semiconductor industry is continually challenged to maintain the trend identified in 1965 b...
Miniaturization has become the key word in microelectronics. Indeed, manufacturers aim at shrinkingd...
In the past 50 years, photolithography has enable continuous scaling down of microelectronic devices...
The proposed paper investigates the effects of ultra-pure water on DUV photoresist used in 193 nm im...
It is possible to extend optical lithography by using immersion imaging methods. Historically, the a...
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of...
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of...
Immersion lithography has emerged as the next technology to achieve the resolution improvement need...
Advances in the semiconductor industry are mainly driven by improvements in optical lithography tech...
Immersion lithography has emerged as the next technology to achieve the resolution improvement need...
Society in the XXIst century is significantly impacted by the widespread use of electronic devices, ...
textImmersion lithography has emerged as the next technology to achieve the resolution improvement ...
textImmersion lithography has emerged as the next technology to achieve the resolution improvement ...
For the next-generation immersion lithography technology, there is a growing interest in the immersi...
As an emerging technique, immersion lithography offers the capability of reducing critical dimension...
textThe semiconductor industry is continually challenged to maintain the trend identified in 1965 b...
Miniaturization has become the key word in microelectronics. Indeed, manufacturers aim at shrinkingd...
In the past 50 years, photolithography has enable continuous scaling down of microelectronic devices...