In order to confidently reproduce results obtained from experimentation or standard processing, the stability of the involved equipment’s performance must be understood. Therefore, it is important to monitor, on a regular basis, the outputs of an equipment set which are delivering a desired process. In this paper, a qualification test or qual” will be defined for RIT’s 150mm i-line photolithography process which utilizes a Canon FPA 2000-i1 exposure tool
The HIT Factory is currently in the development phase for a 6 inch sub-micron CMOS process. The addi...
Chemically Amplified Advanced Negative Resist for G line application was evaluated under three diffe...
In the past, a Perkin Elmer Development Rate Monitor (DRM) has been used to measure the development ...
In order to confidently reproduce results obtained from experimentation or standard processing, the ...
This project involved the simulation and analysis of critical dimensions (CD) using the RIT Canon 20...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
Development rate measurement (DRM) analysis yields very accurate resist modeling parameters. A proce...
In lithography employed in IC fabrication, focus and exposure directly determine the printed resist ...
Various methods of production sensitometric testing of lithographic films are investigated to establ...
Experimental analysis via the Perkin Elmer Development Rate Monitor (DRM) has determined that KTI-82...
Collection of linewidth data is an important part of photoresist characterization. Linewidth data ar...
A track-mounted, in-situ Dissolution Rate Monitor (DRM) is used to study the impact of exposure vari...
Wafertrac processing was used to optimize the photolithographic process of Shipley 812 positive phot...
This project developed a test chip designed to standardize the testing requirements and characterize...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
The HIT Factory is currently in the development phase for a 6 inch sub-micron CMOS process. The addi...
Chemically Amplified Advanced Negative Resist for G line application was evaluated under three diffe...
In the past, a Perkin Elmer Development Rate Monitor (DRM) has been used to measure the development ...
In order to confidently reproduce results obtained from experimentation or standard processing, the ...
This project involved the simulation and analysis of critical dimensions (CD) using the RIT Canon 20...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
Development rate measurement (DRM) analysis yields very accurate resist modeling parameters. A proce...
In lithography employed in IC fabrication, focus and exposure directly determine the printed resist ...
Various methods of production sensitometric testing of lithographic films are investigated to establ...
Experimental analysis via the Perkin Elmer Development Rate Monitor (DRM) has determined that KTI-82...
Collection of linewidth data is an important part of photoresist characterization. Linewidth data ar...
A track-mounted, in-situ Dissolution Rate Monitor (DRM) is used to study the impact of exposure vari...
Wafertrac processing was used to optimize the photolithographic process of Shipley 812 positive phot...
This project developed a test chip designed to standardize the testing requirements and characterize...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
The HIT Factory is currently in the development phase for a 6 inch sub-micron CMOS process. The addi...
Chemically Amplified Advanced Negative Resist for G line application was evaluated under three diffe...
In the past, a Perkin Elmer Development Rate Monitor (DRM) has been used to measure the development ...