Add to ORKGCharacterization of a GCA 4800 stepper was done in order to assess the system capability for image quality and overlay. This was achieved through running stepper jobs two or three times per week. Data was statistically analyzed and the results showed good agreement with accepted values with the exception of system registration [1]
In order to confidently reproduce results obtained from experimentation or standard processing, the ...
The increasingly stringent tolerance of linewidths is a result of shrinking feature size of integrat...
In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) o...
The following work lays the foundation for the further development of high resolution photolithograp...
This project involved the simulation and analysis of critical dimensions (CD) using the RIT Canon 20...
Stepper related contributions to the overlay budget, such as alignment accuracy and displacements du...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
I-line lithography offers the capability to achieve half- micron integrated circuit design rules. Su...
Utilization of the GCA DSW 4800 as a PHOTOREPEATER enables the production of masks with flexibility,...
A pinhole camera was used to evaluate source geometry of the GCA6700 g-line stepper. To create the c...
Lithography is one of the most crucial processes that is used in modern integrated circuit (IC) fabr...
In this work we found optimum exposure parameters and determined a process window for a 1X Stepper t...
The possibilities of in-process blue image sensing by using only the implemented darkfield TTL align...
The Perkin Elmer Model 140 was investigated for second level alignment. Using a photolithographic ev...
Abstract—This paper presents a new run-to-run control scheme to reduce overlay misalignment errors i...
In order to confidently reproduce results obtained from experimentation or standard processing, the ...
The increasingly stringent tolerance of linewidths is a result of shrinking feature size of integrat...
In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) o...
The following work lays the foundation for the further development of high resolution photolithograp...
This project involved the simulation and analysis of critical dimensions (CD) using the RIT Canon 20...
Stepper related contributions to the overlay budget, such as alignment accuracy and displacements du...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
I-line lithography offers the capability to achieve half- micron integrated circuit design rules. Su...
Utilization of the GCA DSW 4800 as a PHOTOREPEATER enables the production of masks with flexibility,...
A pinhole camera was used to evaluate source geometry of the GCA6700 g-line stepper. To create the c...
Lithography is one of the most crucial processes that is used in modern integrated circuit (IC) fabr...
In this work we found optimum exposure parameters and determined a process window for a 1X Stepper t...
The possibilities of in-process blue image sensing by using only the implemented darkfield TTL align...
The Perkin Elmer Model 140 was investigated for second level alignment. Using a photolithographic ev...
Abstract—This paper presents a new run-to-run control scheme to reduce overlay misalignment errors i...
In order to confidently reproduce results obtained from experimentation or standard processing, the ...
The increasingly stringent tolerance of linewidths is a result of shrinking feature size of integrat...
In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) o...