Add to ORKGThis project involved the definition of the steps necessary to generate a mask or reticle for any of the three exposure tools (te. GCA lox G-line Stepper, Perkin Elmer Scanning Aligners, and Kasper Contact Aligners) used at RIT. Next a working process for creating chrome masks for the Perkin Elmer Scanners was developed. Using the process outlined in this paper 5 micron line widths can be repeatedly obtained
A process for the fabrication of binary optics at the Rochester Institute of Technology was establis...
Pour les technologies avancées, la lithographie optique par immersion utilisant des sources 193nm at...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
This project involved the definition of the steps necessary to generate a mask or reticle for any of...
Utilization of the GCA DSW 4800 as a PHOTOREPEATER enables the production of masks with flexibility,...
Over the past 25 years, following the International Technology Roadmap for Semiconductors1, the main...
An investigation of the possibility of spin-coating a silver halide emusion similar to that used on ...
Using edge gradient analysis on chrome and emulsion photomasks to determine the modulation transfer ...
Recently, the design of integrated circuits has become more and more complicated due to higher circu...
This project investigated the concept of a chromeless phase-shifting mask. An optical simulator, SPL...
The goal of this project is to design, fabricate, and characterize alternating phase shift masks for...
A normal binary chrome mask is designed with optical proximity correction features to test their eff...
An investigation of the possibility of spin-coating a silver halide emusion similar to that used on ...
A photomask typically consists of a bulk transparent substrate and a thin metallic film with etched ...
Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for...
A process for the fabrication of binary optics at the Rochester Institute of Technology was establis...
Pour les technologies avancées, la lithographie optique par immersion utilisant des sources 193nm at...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...
This project involved the definition of the steps necessary to generate a mask or reticle for any of...
Utilization of the GCA DSW 4800 as a PHOTOREPEATER enables the production of masks with flexibility,...
Over the past 25 years, following the International Technology Roadmap for Semiconductors1, the main...
An investigation of the possibility of spin-coating a silver halide emusion similar to that used on ...
Using edge gradient analysis on chrome and emulsion photomasks to determine the modulation transfer ...
Recently, the design of integrated circuits has become more and more complicated due to higher circu...
This project investigated the concept of a chromeless phase-shifting mask. An optical simulator, SPL...
The goal of this project is to design, fabricate, and characterize alternating phase shift masks for...
A normal binary chrome mask is designed with optical proximity correction features to test their eff...
An investigation of the possibility of spin-coating a silver halide emusion similar to that used on ...
A photomask typically consists of a bulk transparent substrate and a thin metallic film with etched ...
Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for...
A process for the fabrication of binary optics at the Rochester Institute of Technology was establis...
Pour les technologies avancées, la lithographie optique par immersion utilisant des sources 193nm at...
Of the many facets of integrated circuit fabrication, photolithography may very well be the most imp...