The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral range of 300nm to 500nm. A xenon-source monochrometer was used in a hard contact exposing system. Se/isitivity is defined as the inverse of the exposure (mj/cm ) needed to produce an image in a photoresist coated plate having walls of 70 normal slope. Low intensity reciprocity law failure has been conclusively shown to exist in this resist with exposure intensities of 100 mw/cm and below. Guide lines have been drawn up, based on the procedures and results of the experimentation, to assist photoresist users in determining the spectral sensitivity of a photoresist. The feasibility of these procedures has been determined to be positive
Thesis (M.A.)--Boston UniversityThe spectral sensitivity of five film types was measured over a regi...
Undyed, AZ 1512,and dyed, AZ 1512-SFD, photoresist was coated on aluminum covered oxide topography. ...
A static coating program and a spray/static development program were developed, for use on the Wafer...
The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral ran...
This thesis was performed to determine if low intensity reciprocity law -failure (RLF) exists in Kod...
An intensity scale monochromatic sensitometer was constructed using a Bausch and Lomb single-pass di...
Author Institution: Solid State Physics Research Laboratory, Wright-Patterson Air Force Base, Ohio 4...
An attempt was made to correct the spectral sensitivity of a silicon photodiode, by using optical fi...
An Intensity Scale Sensitometer for testing the photographic response of Graphic Arts materials was ...
Weighting or assessment factors of near-infrared photocathodes and Kodak 5424 film are determined fo...
Experimental analysis via the Perkin Elmer Development Rate Monitor (DRM) has determined that KTI-82...
A Kodak Model 101 sensitometer has been improved from the original design and also been made more ve...
Four desktop sensitometers of stereolithographic resins were created and tested against the characte...
Chemically Amplified Advanced Negative Resist for G line application was evaluated under three diffe...
Author Institution: Camera Works, Eastman Kodak CompanyA high sensitivity, chemically deposited, lea...
Thesis (M.A.)--Boston UniversityThe spectral sensitivity of five film types was measured over a regi...
Undyed, AZ 1512,and dyed, AZ 1512-SFD, photoresist was coated on aluminum covered oxide topography. ...
A static coating program and a spray/static development program were developed, for use on the Wafer...
The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral ran...
This thesis was performed to determine if low intensity reciprocity law -failure (RLF) exists in Kod...
An intensity scale monochromatic sensitometer was constructed using a Bausch and Lomb single-pass di...
Author Institution: Solid State Physics Research Laboratory, Wright-Patterson Air Force Base, Ohio 4...
An attempt was made to correct the spectral sensitivity of a silicon photodiode, by using optical fi...
An Intensity Scale Sensitometer for testing the photographic response of Graphic Arts materials was ...
Weighting or assessment factors of near-infrared photocathodes and Kodak 5424 film are determined fo...
Experimental analysis via the Perkin Elmer Development Rate Monitor (DRM) has determined that KTI-82...
A Kodak Model 101 sensitometer has been improved from the original design and also been made more ve...
Four desktop sensitometers of stereolithographic resins were created and tested against the characte...
Chemically Amplified Advanced Negative Resist for G line application was evaluated under three diffe...
Author Institution: Camera Works, Eastman Kodak CompanyA high sensitivity, chemically deposited, lea...
Thesis (M.A.)--Boston UniversityThe spectral sensitivity of five film types was measured over a regi...
Undyed, AZ 1512,and dyed, AZ 1512-SFD, photoresist was coated on aluminum covered oxide topography. ...
A static coating program and a spray/static development program were developed, for use on the Wafer...