In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm for stochastical and numerical studies to investigate the systematic impacts of line edge roughness on light diffraction pattern of periodic line-space structures. The key concept is the generation of ensembles of rough apertures composed of many slits, to calculate the irradiance of the illuminated rough apertures far away from the aperture plane, and a comparison of their light intensities to those of the undisturbed, ’non-rough’ aperture. We apply the Fraunhofer approximation and interpret the rough apertures as binary 2D-gratings to compute their diffraction patterns very efficiently as the 2D-Fourier transform of the light distribution of...
The light scattering of rough metallic surfaces with roughness levels ranging from a few to several ...
In this work, we analyze the far-field pattern produced by a grating made of strips with two differe...
Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithog...
In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm f...
We investigate the impact of line edge and line width roughness (LER, LWR) on the measured diffracti...
We analyze the far field and near field diffraction pattern produced by an amplitude grating whose s...
We investigate the far field diffraction process produced by diffraction gratings with two roughness...
Smaller and more complex three dimensional periodic nanostructures are part of the next generation o...
In this work, we illustrate the benefits and problems of mathematical modelling and effective numeri...
Scatterometry as a non-imaging indirect optical method in wafer metrology is applicable to lithograp...
In recent years, the scattering properties of optical gratings became of high interest. In particula...
Increasing miniaturization and complexity of nanostructures, e.g. in semiconductor industry, require...
Thesis (M.S.)--University of Rochester. College of Engineering and Applied Science. Institute of Opt...
We discuss numerical algorithms for the determination of periodic surface structures from light diff...
International audienceWe used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to stud...
The light scattering of rough metallic surfaces with roughness levels ranging from a few to several ...
In this work, we analyze the far-field pattern produced by a grating made of strips with two differe...
Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithog...
In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm f...
We investigate the impact of line edge and line width roughness (LER, LWR) on the measured diffracti...
We analyze the far field and near field diffraction pattern produced by an amplitude grating whose s...
We investigate the far field diffraction process produced by diffraction gratings with two roughness...
Smaller and more complex three dimensional periodic nanostructures are part of the next generation o...
In this work, we illustrate the benefits and problems of mathematical modelling and effective numeri...
Scatterometry as a non-imaging indirect optical method in wafer metrology is applicable to lithograp...
In recent years, the scattering properties of optical gratings became of high interest. In particula...
Increasing miniaturization and complexity of nanostructures, e.g. in semiconductor industry, require...
Thesis (M.S.)--University of Rochester. College of Engineering and Applied Science. Institute of Opt...
We discuss numerical algorithms for the determination of periodic surface structures from light diff...
International audienceWe used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to stud...
The light scattering of rough metallic surfaces with roughness levels ranging from a few to several ...
In this work, we analyze the far-field pattern produced by a grating made of strips with two differe...
Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithog...