Oxidation behaviour of nanostructured Ti-B-N based coatings

Nanostructured Ti-B-N based coatings are widely employed in many applications for the excellent propertiessuch as high hardness, low friction, good resistance to wear and corrosion. In addition, if some alloyingelements such Al and Si are incorporated an oxidation improved resistance is achieved. In the present work,Ti-B-N, Ti-Si-B-N and Ti-Al-Si-B-N coatings deposited by Ion Implantation Assisted Magnetron Sputtering(IIAMS) have been investigated. All the coatings were deposited on single-crystal Si-[100]. To evaluate theoxidation behavior, the coatings were annealed in air at 700 and 900°C for 4 hours. Ti-B-N coatings oxidizescompletely after annealing at 700°C for 4 hours, while a layered structure with well-definite interface isproduced on Ti-Si-B-N and Ti-Al-Si-B-N based coatings. Upon annealing at 900°C, the Si-doped film showedsignificantly better oxidation resistance compared to that of Ti-B-N and Ti-Al-Si-B-N coatings