Add to ORKGAluminum thin films have been investigated in an effort to relate measurable resistive and observable structural aspects to deposition parameters
Thin Al films are deposited onto glass substrates at 573 K in high vacuum. The electrical resistivit...
New aluminium alloys are required with strengths comparable with those of conventional precipitation...
The resistivity of the V-Al alloy films of various thicknesses and compositions was studied as a fun...
The primary objectives of this paper were to investigate the effects of deposition rate and substrat...
Aluminum thin films were deposited on amorphous substrates by getter sputtering. The effects of subs...
Aluminum (Al) films with thickness of 100 nm were grown on unheated glass, silicon and mica substrat...
Methods used to determine the aluminum coating thickness on polymer films may not measure the geomet...
This thesis submitted in partial fulfillment of the requirements for the degree of Masters of Scienc...
This research was to verify the hypothesis that resistivity of metal\u27s thin film deposited in a l...
A discussion of electrical properties of amorphous thin films of Al−In2O3−Al structure is presented....
The study deals with the vacuum evaporation technique of thin layers, considering different process ...
AbstractAluminum film deposited on GFRP, in this paper by cathodic arc technology for decreasing the...
The analysis of the internal stress in deposited aluminum layers is demonstrated and dependences of ...
The interaction between an aluminum film and a W-Ti film during annealing was monitored by sheet res...
Industrial polyethylene terephthalate (PET) films have been metallized by aluminium evaporation in t...
Thin Al films are deposited onto glass substrates at 573 K in high vacuum. The electrical resistivit...
New aluminium alloys are required with strengths comparable with those of conventional precipitation...
The resistivity of the V-Al alloy films of various thicknesses and compositions was studied as a fun...
The primary objectives of this paper were to investigate the effects of deposition rate and substrat...
Aluminum thin films were deposited on amorphous substrates by getter sputtering. The effects of subs...
Aluminum (Al) films with thickness of 100 nm were grown on unheated glass, silicon and mica substrat...
Methods used to determine the aluminum coating thickness on polymer films may not measure the geomet...
This thesis submitted in partial fulfillment of the requirements for the degree of Masters of Scienc...
This research was to verify the hypothesis that resistivity of metal\u27s thin film deposited in a l...
A discussion of electrical properties of amorphous thin films of Al−In2O3−Al structure is presented....
The study deals with the vacuum evaporation technique of thin layers, considering different process ...
AbstractAluminum film deposited on GFRP, in this paper by cathodic arc technology for decreasing the...
The analysis of the internal stress in deposited aluminum layers is demonstrated and dependences of ...
The interaction between an aluminum film and a W-Ti film during annealing was monitored by sheet res...
Industrial polyethylene terephthalate (PET) films have been metallized by aluminium evaporation in t...
Thin Al films are deposited onto glass substrates at 573 K in high vacuum. The electrical resistivit...
New aluminium alloys are required with strengths comparable with those of conventional precipitation...
The resistivity of the V-Al alloy films of various thicknesses and compositions was studied as a fun...