Add to ORKGAluminum thin films were deposited on amorphous substrates by getter sputtering. The effects of substrate temperature and deposition rate on the growth, structure, and electrical properties of the films were studied with the aid of electron microscopy
Thin films of alumina were deposited on ferrite (NiₓZn₍₁₋ₓ₎Fe₂O₄), glass, single crystal silicon and...
The growth of polycrystalline and amorphous aluminum-oxygen alloy films using electron-investigated ...
It is impossible to deposit aluminum from aqueous solution because hydrogen generation occur before ...
The primary objectives of this paper were to investigate the effects of deposition rate and substrat...
Abstract. The morphology and grown mechanism of aluminum films from 3nm to 30nm in thickness onto th...
In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and exam...
Aluminum (Al) films with thickness of 100 nm were grown on unheated glass, silicon and mica substrat...
Abstract : The purpose of this research was to prepare, investigate and understand the characteristi...
Aluminum thin films have been investigated in an effort to relate measurable resistive and observabl...
A solution dipping process consisting of 2 steps, including (i) a catalytic treatment of the substra...
In this research, aluminum (Al) thin films were deposited on SiO2/Si substrates using RF magnetron s...
Direct current magnetron sputtering was used to produce AlNxOy thin films, using an aluminum target,...
Aluminium thin layers thermally evaporated on polyethylene terephthalate (PET) films were sputter et...
A solution-dipping process consisting of 2 steps, including (i) a catalytic treatment of the substra...
temperature could be independently controlled due to the low deposition rate of the aluminium. The d...
Thin films of alumina were deposited on ferrite (NiₓZn₍₁₋ₓ₎Fe₂O₄), glass, single crystal silicon and...
The growth of polycrystalline and amorphous aluminum-oxygen alloy films using electron-investigated ...
It is impossible to deposit aluminum from aqueous solution because hydrogen generation occur before ...
The primary objectives of this paper were to investigate the effects of deposition rate and substrat...
Abstract. The morphology and grown mechanism of aluminum films from 3nm to 30nm in thickness onto th...
In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and exam...
Aluminum (Al) films with thickness of 100 nm were grown on unheated glass, silicon and mica substrat...
Abstract : The purpose of this research was to prepare, investigate and understand the characteristi...
Aluminum thin films have been investigated in an effort to relate measurable resistive and observabl...
A solution dipping process consisting of 2 steps, including (i) a catalytic treatment of the substra...
In this research, aluminum (Al) thin films were deposited on SiO2/Si substrates using RF magnetron s...
Direct current magnetron sputtering was used to produce AlNxOy thin films, using an aluminum target,...
Aluminium thin layers thermally evaporated on polyethylene terephthalate (PET) films were sputter et...
A solution-dipping process consisting of 2 steps, including (i) a catalytic treatment of the substra...
temperature could be independently controlled due to the low deposition rate of the aluminium. The d...
Thin films of alumina were deposited on ferrite (NiₓZn₍₁₋ₓ₎Fe₂O₄), glass, single crystal silicon and...
The growth of polycrystalline and amorphous aluminum-oxygen alloy films using electron-investigated ...
It is impossible to deposit aluminum from aqueous solution because hydrogen generation occur before ...