In this work, TiO2 films on 316L stainless steel have been formed by non-reactive magnetron sputtering of TiO2 target. The effect of a titanium underlayer on the crystalline phase of the TiO2 film has been investigated in terms of phase evolution, film morphology, corrosion resistance, adhesion strength, hardness and tribological characteristics. Results showed that the titanium underlayer has a significant effect on the phase of the TiO2 film. Without this underlayer, an anatase TiO2 film is produced, in consistence with many other investigations. However, it is found that with a titanium underlayer, a rutile TiO2 film can be directly formed on the substrate. The thickness of the interface layer affects the crystallinity of the rutil...
In this work is investigated the optimal conditions for deposition of pure- phase anatase and rutile...
[[abstract]]Titanium dioxide films prepared by magnetron sputtering with titanium dioxide targets, r...
TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reac...
In this work, TiO2 films on 316L stainless steel have been formed by non-reactive magnetron sputteri...
Crystalline TiO2 layers could be deposited on glass and silicon substrates by reactive pulse magnetr...
The rutile phase of TiO2 has raised a wide interest for biomaterial applications. Since rutile is ge...
Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: convent...
TiO2 thin films were prepared by reactive magnetron sputtering. The influences of O2 partial pressur...
Crystalline TiO2 films are in the focus of interest because of their specific properties compared to...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Titanium dioxide (TiO2) with a rutile structure is known for its useful physical, chemical, mechanic...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Thin films of titaniumdioxide (TiO2) are important high refractive index coatings in opticalmultilay...
Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good el...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
In this work is investigated the optimal conditions for deposition of pure- phase anatase and rutile...
[[abstract]]Titanium dioxide films prepared by magnetron sputtering with titanium dioxide targets, r...
TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reac...
In this work, TiO2 films on 316L stainless steel have been formed by non-reactive magnetron sputteri...
Crystalline TiO2 layers could be deposited on glass and silicon substrates by reactive pulse magnetr...
The rutile phase of TiO2 has raised a wide interest for biomaterial applications. Since rutile is ge...
Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: convent...
TiO2 thin films were prepared by reactive magnetron sputtering. The influences of O2 partial pressur...
Crystalline TiO2 films are in the focus of interest because of their specific properties compared to...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Titanium dioxide (TiO2) with a rutile structure is known for its useful physical, chemical, mechanic...
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concent...
Thin films of titaniumdioxide (TiO2) are important high refractive index coatings in opticalmultilay...
Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good el...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
In this work is investigated the optimal conditions for deposition of pure- phase anatase and rutile...
[[abstract]]Titanium dioxide films prepared by magnetron sputtering with titanium dioxide targets, r...
TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reac...