Chemical structure of silicon-based thin films

This bachelor thesis deals with the characterization and preparation of thin polymer films deposited on silicon wafers by plasma-enhanced chemical vapour deposition. The main part of the work is background research in the field of plasma polymerization and infrared spectroscopy. Thin polymer films based on tetravinylsilane and tetravinylsilane with the addition of mixed gas (argon) were prepared in the experimental part. The prepared thin films of plasma polymers were characterized by the selected spectroscopic technique - infrared spectroscopy. Based on the evaluation of transmission infrared spectra, the chemical structure of the deposited polymer films was determined. The determined chemical structures of the prepared films were observed with respect to the deposition conditions and hence the possibility to prepare tailored films for a variety of applications