Intermetallic compounds (IMC) form during the metallurgical bonding processes when the interfaces involve solid metal and molten solder. Cobalt (Co) is a promising candidate to be used as under bump metallization (UBM) material, tin (Sn)-based solder alloying element, and transient liquid phase bonding base metal. This work aims at studying the intermixing reaction in Co–Sn system from electroplated Co and Sn multilayers. Co–Sn couples were sequentially electroplated and reflowed at 400 °C for 1 and 4 h. The microstructure and composition of the phases formed at different reflow duration were characterized by field emission scanning electron microscopy (FESEM) coupled with energy dispersive X-ray spectroscopy (EDX), and X-ray diffraction (X...
[[abstract]]Ni/Cu under-bump metallization (UBM) for flip-chip application is widely used in electro...
The formation and growth of Cu–Sn intermetallic film at the interface between molten Sn–Pb solders a...
Rapid Cu diffusion is one of the main causes of electromigration (EM) failure in lead-free solder jo...
© 2015 Elsevier B.V. Abstract Cobalt exhibits good wetting by lead-free solders (Humpston, 2010) [1]...
Cobalt-based X-45 and FSX-414 superalloys with interlayer BNi-9 have been bonded by a transient liqu...
Ni and its alloys possess a lower reaction rate with Sn than Cu and Cu alloys. Ni-based under bump m...
Most micro-electro-mechanical systems (MEMS) devices contain fragile moving parts, which poses chall...
The potential of cobalt substrates to control the microstructure of 550 μm Sn-3Ag-0.5Cu ball grid ar...
The interfacial reactions between Sn-0.4Co-0.7Cu eutectic alloy and immersion Au/electroless Ni(P)/C...
Funding Information: This work was supported by the Innovation Funding Agency Business Finland. The ...
This study investigated the fusion and phase-transformation processes of nano-intermetallic compound...
The formation of intermetallic compound (IMC) layer at the interfaces of pad finishes has been studi...
In this paper, the results of a study on the effect of multiple reflow on the mechanism of intermeta...
The interfacial microstructure of electroless Ni-P/Sn-3.5Ag solder joints was investigated after ref...
In order to address the issue for the usage of electronic systems in harsh conditions such as high t...
[[abstract]]Ni/Cu under-bump metallization (UBM) for flip-chip application is widely used in electro...
The formation and growth of Cu–Sn intermetallic film at the interface between molten Sn–Pb solders a...
Rapid Cu diffusion is one of the main causes of electromigration (EM) failure in lead-free solder jo...
© 2015 Elsevier B.V. Abstract Cobalt exhibits good wetting by lead-free solders (Humpston, 2010) [1]...
Cobalt-based X-45 and FSX-414 superalloys with interlayer BNi-9 have been bonded by a transient liqu...
Ni and its alloys possess a lower reaction rate with Sn than Cu and Cu alloys. Ni-based under bump m...
Most micro-electro-mechanical systems (MEMS) devices contain fragile moving parts, which poses chall...
The potential of cobalt substrates to control the microstructure of 550 μm Sn-3Ag-0.5Cu ball grid ar...
The interfacial reactions between Sn-0.4Co-0.7Cu eutectic alloy and immersion Au/electroless Ni(P)/C...
Funding Information: This work was supported by the Innovation Funding Agency Business Finland. The ...
This study investigated the fusion and phase-transformation processes of nano-intermetallic compound...
The formation of intermetallic compound (IMC) layer at the interfaces of pad finishes has been studi...
In this paper, the results of a study on the effect of multiple reflow on the mechanism of intermeta...
The interfacial microstructure of electroless Ni-P/Sn-3.5Ag solder joints was investigated after ref...
In order to address the issue for the usage of electronic systems in harsh conditions such as high t...
[[abstract]]Ni/Cu under-bump metallization (UBM) for flip-chip application is widely used in electro...
The formation and growth of Cu–Sn intermetallic film at the interface between molten Sn–Pb solders a...
Rapid Cu diffusion is one of the main causes of electromigration (EM) failure in lead-free solder jo...