The results of equilibrium composition and total enthalpy computation in the temperature range of 1000 to 6000 K and at pressure of 1 bar, for the systems LT (BOHN)under bar GT and LT (BOCHN)under bar GT are presented in the paper. These data enable the determination, and optimization of mass, temperature and energy parameters of the process for ultrafine boron nitride powder production by the boric acid (H3BO3) decomposition in nitrogen plasma, followed by reactive quenching with cold methane or propane-butane gas. In both cases for the optimized processes yield of boron nitride powder can be up to 100% in wide temperature range. (C) 2000 Elsevier Science Ltd and Techna S.r.l. All rights reserved
The kinetics of CVD of boron nitride from a gas mixture of 1,3,5-tri(N-methyl)borazine (TMB), ammoni...
A proper control of the CVD of boron nitride from the B-N-H-F-Ar system, as very thin films in elect...
Boron nitride films were deposited by controlled plasma assisted chemical vapor deposition (PACVD) o...
The results of equilibrium composition and total enthalpy computation in the temperature range of 10...
AbstractBoron nitride (BN) was prepared by nitriding pure boron (B) deposited on carbon substrates b...
This work studies the deposition of boron/boron nitride (B/BN) composite films at low substrate temp...
The results of research of plasma chemical synthesis of BN-coatings are given; these coatings contai...
Boron nitride (BN) powder was prepared by nitriding a mixture of boron trioxide or boric acid or bor...
We have developed a method for producing spherically-shaped, hexagonal phase boron nitride (hBN) par...
Boron nitride is found mainly in two crystal structures; in hexagonal structure (h-BN) which is very...
The results of equilibrium composition and total enthalpy computation in the temperature range of 10...
Plasma methods offer a variety of advantages to nanomaterials synthesis. The process is robust, allo...
N-Trimethylborazine vapour was fed into the downstream region of an ECR plasma source to deposit cub...
For thermal plasma processing of solid particles (including processes like plasma spraying, spheroid...
Nanocrystalline boron nitride powders were synthesized by combustion process using urea as a fuel. ...
The kinetics of CVD of boron nitride from a gas mixture of 1,3,5-tri(N-methyl)borazine (TMB), ammoni...
A proper control of the CVD of boron nitride from the B-N-H-F-Ar system, as very thin films in elect...
Boron nitride films were deposited by controlled plasma assisted chemical vapor deposition (PACVD) o...
The results of equilibrium composition and total enthalpy computation in the temperature range of 10...
AbstractBoron nitride (BN) was prepared by nitriding pure boron (B) deposited on carbon substrates b...
This work studies the deposition of boron/boron nitride (B/BN) composite films at low substrate temp...
The results of research of plasma chemical synthesis of BN-coatings are given; these coatings contai...
Boron nitride (BN) powder was prepared by nitriding a mixture of boron trioxide or boric acid or bor...
We have developed a method for producing spherically-shaped, hexagonal phase boron nitride (hBN) par...
Boron nitride is found mainly in two crystal structures; in hexagonal structure (h-BN) which is very...
The results of equilibrium composition and total enthalpy computation in the temperature range of 10...
Plasma methods offer a variety of advantages to nanomaterials synthesis. The process is robust, allo...
N-Trimethylborazine vapour was fed into the downstream region of an ECR plasma source to deposit cub...
For thermal plasma processing of solid particles (including processes like plasma spraying, spheroid...
Nanocrystalline boron nitride powders were synthesized by combustion process using urea as a fuel. ...
The kinetics of CVD of boron nitride from a gas mixture of 1,3,5-tri(N-methyl)borazine (TMB), ammoni...
A proper control of the CVD of boron nitride from the B-N-H-F-Ar system, as very thin films in elect...
Boron nitride films were deposited by controlled plasma assisted chemical vapor deposition (PACVD) o...