A simple analytical model of thin-body In0.53Ga0.47As-on-InP MOSFET low-field electron mobility suitable for integration in Technology-CAD (TCAD) tools is presented. Phonon, Coulomb and surface roughness scattering are accounted for. In order to characterize the phonon scattering contribution, an expression for the device effective thickness is derived from 1-D Schroedinger-Poisson simulations. The model is validated through comparison with experimental CG-Vgs and Id-Vgs curves collected on transistors with body thicknesses down to 5 nm
This paper presents a new model for the surface roughness (SR) limited mobility in MOS transistors. ...
A number of experiments have recently appeared in the literature that extensively investigate the si...
In this paper, together with the accompanying Part I, an easy-to-implement electron mobility model w...
A simple analytical model of thin-body In0.53Ga0.47As-on-InP MOSFET low-field electron mobility suit...
A simple analytical low-field electron mobility model to be employed for technology computer-aided d...
A new approach for including quasi-ballistic effects into TCAD drift diffusion simulations of short-...
An easy-to-implement electron mobility model, which accurately predicts low-field mobility in the ch...
TCAD modelling of InGaAs channel MOSFETs is a complex task due to the combined effect of quantizatio...
We report mobility simulations for long channel Si and InGaAs MOSFETs as a function of the semicondu...
With the continued scaling down of MOSFET dimensions has come the introduction of high-κ gate insula...
A new semi-empirical model for the electron and hole mobilities of the MOSFET inversion layers is pr...
An easy-to-implement hole mobility model, which accurately predicts low-field mobility in bulk MOSFE...
Abstract: A new semiempirical model for the electron and hole mobilities of the MOSFET inversion lay...
This paper presents a new model for the surface roughness (SR) limited mobility in MOS transistors. ...
This paper presents a new model for the surface roughness (SR) limited mobility in MOS transistors. ...
A number of experiments have recently appeared in the literature that extensively investigate the si...
In this paper, together with the accompanying Part I, an easy-to-implement electron mobility model w...
A simple analytical model of thin-body In0.53Ga0.47As-on-InP MOSFET low-field electron mobility suit...
A simple analytical low-field electron mobility model to be employed for technology computer-aided d...
A new approach for including quasi-ballistic effects into TCAD drift diffusion simulations of short-...
An easy-to-implement electron mobility model, which accurately predicts low-field mobility in the ch...
TCAD modelling of InGaAs channel MOSFETs is a complex task due to the combined effect of quantizatio...
We report mobility simulations for long channel Si and InGaAs MOSFETs as a function of the semicondu...
With the continued scaling down of MOSFET dimensions has come the introduction of high-κ gate insula...
A new semi-empirical model for the electron and hole mobilities of the MOSFET inversion layers is pr...
An easy-to-implement hole mobility model, which accurately predicts low-field mobility in bulk MOSFE...
Abstract: A new semiempirical model for the electron and hole mobilities of the MOSFET inversion lay...
This paper presents a new model for the surface roughness (SR) limited mobility in MOS transistors. ...
This paper presents a new model for the surface roughness (SR) limited mobility in MOS transistors. ...
A number of experiments have recently appeared in the literature that extensively investigate the si...
In this paper, together with the accompanying Part I, an easy-to-implement electron mobility model w...