The growth of vanadium silicides in V-Si diffusion couples is followed by scanning electron microscopy. A suitable mathematical model to evaluate the kinetic growth and the diffusion coefficients of the metals in the silicides is proposed
A theoretical approach is developed which describes the growth kinetics of thin films of near noble ...
Bibliography: pages 210-215.A theory for the growth kinetics of planar silicide formation in single-...
In view of the importance of the suicides in the high temperature applications, the diffusion behavi...
The growth of vanadium silicides in V-Si diffusion couples is followed by scanning electron microsco...
The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is fol...
The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is fol...
The growth of silicides of V and Ta is investigated in planar diffusion couples by Scanning electron...
The growth of Transition Metal Silicides in Metal-Silicon Diffusion Couples is followed by scanning ...
The growth of Transition Metal Silicides in Metal-Silicon Diffusion Couples is followed by scanning ...
The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanni...
An original kinetic model to calculate the diffusion coefficients of the metals in silicides layers ...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
The diffusion-controlled growth of vanadium silicides (V3Si, V5Si3, V6Si5, VSi2) was studied on bulk...
AbstractA theoretical approach is developed which describes the growth kinetics of thin films of nea...
A theoretical approach is developed which describes the growth kinetics of thin films of near noble ...
Bibliography: pages 210-215.A theory for the growth kinetics of planar silicide formation in single-...
In view of the importance of the suicides in the high temperature applications, the diffusion behavi...
The growth of vanadium silicides in V-Si diffusion couples is followed by scanning electron microsco...
The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is fol...
The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is fol...
The growth of silicides of V and Ta is investigated in planar diffusion couples by Scanning electron...
The growth of Transition Metal Silicides in Metal-Silicon Diffusion Couples is followed by scanning ...
The growth of Transition Metal Silicides in Metal-Silicon Diffusion Couples is followed by scanning ...
The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanni...
An original kinetic model to calculate the diffusion coefficients of the metals in silicides layers ...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
The diffusion-controlled growth of vanadium silicides (V3Si, V5Si3, V6Si5, VSi2) was studied on bulk...
AbstractA theoretical approach is developed which describes the growth kinetics of thin films of nea...
A theoretical approach is developed which describes the growth kinetics of thin films of near noble ...
Bibliography: pages 210-215.A theory for the growth kinetics of planar silicide formation in single-...
In view of the importance of the suicides in the high temperature applications, the diffusion behavi...
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