In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel substrate by a DC and RF reactive magnetron co-sputtering technique using an Ar-N2 plasma. The structure of the coatings was characterized by means of XRD (X-ray Diffraction). The substrate and coating corrosion resistance were evaluated by potentiodynamic polarization using a Ringer solution as electrolyte. Corrosion tests were conducted with the purpose to evaluate the potential of this coating to be used on biomedical alloys. IBA (Ion Beam Analysis) techniques were applied to measure the elemental composition profiles of the films and, XPS (X-ray Photoelectron Spectroscopy) were used as a complementary technique to obtain information abou...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
The present study deals with TiN/Si bilayers irradiated at room temperature (RT) with 120 keV Ar ion...
In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel...
A dual ion beam system is used to produce hard nanocomposite TiN/Si3N4 coatings on Si. Cross-section...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
TiN thin films have been deposited by magnetron sputtering (DC) method under pure argon (100% Ar) ga...
TiN/Ti multilayers, 1.74-9.80 μm thick, were deposited on 304 stainless steel substrates by reactive...
A novel TiAlCN/CNx multilayer coating, consisting of nine TiAlCN/CNx periods with a top layer 0.5 μm...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
The present study deals with TiN/Si bilayers irradiated at room temperature (RT) with 120 keV Ar ion...
In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel...
A dual ion beam system is used to produce hard nanocomposite TiN/Si3N4 coatings on Si. Cross-section...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
TiN thin films have been deposited by magnetron sputtering (DC) method under pure argon (100% Ar) ga...
TiN/Ti multilayers, 1.74-9.80 μm thick, were deposited on 304 stainless steel substrates by reactive...
A novel TiAlCN/CNx multilayer coating, consisting of nine TiAlCN/CNx periods with a top layer 0.5 μm...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
The present study deals with TiN/Si bilayers irradiated at room temperature (RT) with 120 keV Ar ion...