In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel substrate by a DC and RF reactive magnetron co-sputtering technique using an Ar-N2 plasma. The structure of the coatings was characterized by means of XRD (X-ray Diffraction). The substrate and coating corrosion resistance were evaluated by potentiodynamic polarization using a Ringer solution as electrolyte. Corrosion tests were conducted with the purpose to evaluate the potential of this coating to be used on biomedical alloys. IBA (Ion Beam Analysis) techniques were applied to measure the elemental composition profiles of the films and, XPS (X-ray Photoelectron Spectroscopy) were used as a complementary technique to obtain information abou...
Titanium nitride (TiN) films were deposited on AISI 316L stainless steel substrates by reactive magn...
This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin film...
TiN/Ti multilayers, 1.74-9.80 μm thick, were deposited on 304 stainless steel substrates by reactive...
In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
A dual ion beam system is used to produce hard nanocomposite TiN/Si3N4 coatings on Si. Cross-section...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
TiN thin films have been deposited by magnetron sputtering (DC) method under pure argon (100% Ar) ga...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Titanium nitride (TiN) films were deposited on AISI 316L stainless steel substrates by reactive magn...
This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin film...
TiN/Ti multilayers, 1.74-9.80 μm thick, were deposited on 304 stainless steel substrates by reactive...
In this work, nanocomposite coatings of nc-TiN/a-Si3N 4, were deposited on AISI 316L stainless steel...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
A dual ion beam system is used to produce hard nanocomposite TiN/Si3N4 coatings on Si. Cross-section...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
TiN thin films have been deposited by magnetron sputtering (DC) method under pure argon (100% Ar) ga...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Titanium nitride (TiN) films were deposited on AISI 316L stainless steel substrates by reactive magn...
This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin film...
TiN/Ti multilayers, 1.74-9.80 μm thick, were deposited on 304 stainless steel substrates by reactive...