We describe our experience on design and fabrication, on high-resistivity silicon substrates, of microstrip detectors and integrated electronics, devoted to high-energy physics experiments and medical/industrial imaging applications. We report on the full program of our collaboration, with particular regards to the tuning of a new fabrication process, allowing for the production of good quality transistors, while keeping under control the basic detector parameters, such as leakage current. Experimental results on JFET and bipolar transistors are presented, and a microstrip detector with an integrated JFET in source-follower configuration is introduced
This paper is concerned with the preliminary results of a technological study aimed at the developme...
We report on JFET devices fabricated on high-resistivity silicon with a radiation detector technolog...
In connection with a research project for developing room temperature energy dispersive detectors fo...
We describe our experience on design and fabrication, on high-resistivity silicon substrates, of mic...
We report on an R&D activity aimed at the realisation of silicon microstrip detectors with integrate...
A fabrication technology has been developed at ITC-irst (Trento, Italy) for the realisation of silic...
We report on an research and development activity aimed at the fabrication of silicon microstrip det...
We report on an research and development activity aimed at the fabrication of silicon microstrip det...
We present the developments in a research program aimed at the realization of silicon micro-strip de...
In the past few years we have developed a technological process allowing for the fabrication of radi...
This paper presents the design and experimental results relevant to front-end circuits integrated on...
We report on the development of a radiation-detector compatible JFET technology on high-resistivity ...
We report on the most recent results from an R&D activity aimed at the development of silicon radiat...
The paper describes the technology used for the fabrication of a set of prototypes of microstrip sil...
We report on an improved fabrication technology allowing n-JFET/n-MOSFET charge sensitive amplifiers...
This paper is concerned with the preliminary results of a technological study aimed at the developme...
We report on JFET devices fabricated on high-resistivity silicon with a radiation detector technolog...
In connection with a research project for developing room temperature energy dispersive detectors fo...
We describe our experience on design and fabrication, on high-resistivity silicon substrates, of mic...
We report on an R&D activity aimed at the realisation of silicon microstrip detectors with integrate...
A fabrication technology has been developed at ITC-irst (Trento, Italy) for the realisation of silic...
We report on an research and development activity aimed at the fabrication of silicon microstrip det...
We report on an research and development activity aimed at the fabrication of silicon microstrip det...
We present the developments in a research program aimed at the realization of silicon micro-strip de...
In the past few years we have developed a technological process allowing for the fabrication of radi...
This paper presents the design and experimental results relevant to front-end circuits integrated on...
We report on the development of a radiation-detector compatible JFET technology on high-resistivity ...
We report on the most recent results from an R&D activity aimed at the development of silicon radiat...
The paper describes the technology used for the fabrication of a set of prototypes of microstrip sil...
We report on an improved fabrication technology allowing n-JFET/n-MOSFET charge sensitive amplifiers...
This paper is concerned with the preliminary results of a technological study aimed at the developme...
We report on JFET devices fabricated on high-resistivity silicon with a radiation detector technolog...
In connection with a research project for developing room temperature energy dispersive detectors fo...