New and more complex requirements for multilayer optical coatings are raised due to development of laser technology. Flatness, which is determined by stresses within thin layer of the coating, is one of the important properties of optical components for precise laser systems. Metal oxides mixtures could be possible solution for stress supression, since in this case new material is created with different refractive index and stress properties. Stresses within deposited thin films could also be modified by anealing process. Al2O3-SiO2 mixture with small fraction of alumina could be one of the most perspective combination for SiO2 thin film replacement, since refractive index and extincion coefficient of Al2O3 are relatively small. In this inv...
Reactive magnetron sputtering was used to deposit optical thin films. In order to obtain high deposi...
Ta_2O_5 and SiO_2 thin films, deposited at room temperature by ion-beam sputtering (IBS) and dual io...
Understanding the stress behaviour in atomic layer deposited (ALD) thin films enables the optimizati...
Currently, optical coating technology is facing a multitude of new challenges. Some of the new requi...
Growing requirements for the optical and environmental stability, as well as the radiation resistanc...
The main goal of this research was to examine the possibility of applying ion beam sputtering method...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Growing requirements on the optical and enviromnental stability as well as on the radiation resistan...
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma...
Properties of single-layer and multilayer Al2O3 / SiO2 coatings deposited by Plasma Ion Assisted Dep...
The main limiting factors related to the choice of materials for optical coatings formation - refrac...
Objective of the thesis was to extend the applicability of ion beam sputtered optical coatings for U...
The main aim of this dissertation was to identify physical causes that limit optical component‘s spe...
Optical characteristics of multilayer titanium and silicon oxide structures, deposited by ion beam s...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Reactive magnetron sputtering was used to deposit optical thin films. In order to obtain high deposi...
Ta_2O_5 and SiO_2 thin films, deposited at room temperature by ion-beam sputtering (IBS) and dual io...
Understanding the stress behaviour in atomic layer deposited (ALD) thin films enables the optimizati...
Currently, optical coating technology is facing a multitude of new challenges. Some of the new requi...
Growing requirements for the optical and environmental stability, as well as the radiation resistanc...
The main goal of this research was to examine the possibility of applying ion beam sputtering method...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Growing requirements on the optical and enviromnental stability as well as on the radiation resistan...
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma...
Properties of single-layer and multilayer Al2O3 / SiO2 coatings deposited by Plasma Ion Assisted Dep...
The main limiting factors related to the choice of materials for optical coatings formation - refrac...
Objective of the thesis was to extend the applicability of ion beam sputtered optical coatings for U...
The main aim of this dissertation was to identify physical causes that limit optical component‘s spe...
Optical characteristics of multilayer titanium and silicon oxide structures, deposited by ion beam s...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Reactive magnetron sputtering was used to deposit optical thin films. In order to obtain high deposi...
Ta_2O_5 and SiO_2 thin films, deposited at room temperature by ion-beam sputtering (IBS) and dual io...
Understanding the stress behaviour in atomic layer deposited (ALD) thin films enables the optimizati...