Ti-Si-N coatings were deposited by DC reactive magnetron sputtering on stainless steel AISI 304 substrates varying the N2 flow, in order to study the effect on the structural, mechanical and tribological properties. The coatings were deposited using a 99.999 % purity Ti-Si (90-10 at.%) target. Structural characterization was performed by X-ray diffraction (XRD), observing peaks corresponding to crystalline TiN. As there is no evidence of the formation of the Ti-Si-N , Ti-Si, Ti or Si free phases, it was determined that the compound consists of TiN crystal grains in an amorphous matrix of SiN. This result is supported by FTIR and EDS analysis. The mechanical properties were studied by nanoindentation, obtaining hardness values of approximate...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Filmes de nitreto de titânio e carbeto de titânio foram obtidos por deposição reativa via magnetron ...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Ti-Si-N coatings were deposited by DC reactive magnetron sputtering on stainless steel AISI 304 sub...
TiN/TiAlN (titanium nitride/titanium aluminum nitride) multilayer were deposited by d.c. reactive ma...
TiN/TiAIN multilayer were deposited by means of d.c. reactive Magnetron Sputtering technique using t...
(Ti,Al,Si)N coatings were deposited on HSS or silicon substrates by DC reactive UM magnetron sputter...
Se depositaron recubrimientos de TiSiN mediante D.C Magnetrón Sputtering reactivo sobre sustratos de...
This paper examines the fabrication and properties of nanostructured composites based on silicon nit...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In recent years, nitride coatings have found widespread applications for tool and other hard surface...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios suc...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
Ti–Si–C thin films were deposited onto silicon, stainless steel and high-speed steel substrates by m...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Filmes de nitreto de titânio e carbeto de titânio foram obtidos por deposição reativa via magnetron ...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Ti-Si-N coatings were deposited by DC reactive magnetron sputtering on stainless steel AISI 304 sub...
TiN/TiAlN (titanium nitride/titanium aluminum nitride) multilayer were deposited by d.c. reactive ma...
TiN/TiAIN multilayer were deposited by means of d.c. reactive Magnetron Sputtering technique using t...
(Ti,Al,Si)N coatings were deposited on HSS or silicon substrates by DC reactive UM magnetron sputter...
Se depositaron recubrimientos de TiSiN mediante D.C Magnetrón Sputtering reactivo sobre sustratos de...
This paper examines the fabrication and properties of nanostructured composites based on silicon nit...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In recent years, nitride coatings have found widespread applications for tool and other hard surface...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios suc...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
Ti–Si–C thin films were deposited onto silicon, stainless steel and high-speed steel substrates by m...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Filmes de nitreto de titânio e carbeto de titânio foram obtidos por deposição reativa via magnetron ...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...