International audienceRapid progress in the performance of organic devices has increased the demand for advances in the technology of thin-film permeation barriers and understanding the failure mechanisms of these material systems. Herein, we report the extensive study of mechanical and gas barrier properties of Al2O3/ZnO nanolaminate films prepared on organic substrates by atomic layer deposition (ALD). Nanolaminates of Al2O3/ZnO and single compound films of around 250 nm thickness were deposited on polyethylene terephthalate (PET) foils by ALD at 90 degrees C using trimethylaluminium (TMA) and diethylzinc (DEZ) as precursors and H2O as the co-reactant. STEM analysis of the nanolaminate structure revealed that steady-state film growth on P...
We investigated the characteristics of 100 nm-thick Al2O3/ZrO2 laminated films grown by ozone (O-3)-...
Organic electronic devices require a passivation layer that protects the active layers from moisture...
Atomic layer deposition (ALD) uses surface reactions of gaseous precursors to grow thin films of mat...
Rapid progress in the performance of organic devices has increased the demand for advances in the te...
Hybrid ZnO/Al2O3 layers grown by atomic layer deposition (ALD) at extremely low temperature (60 degr...
Thin atomic layer deposited (ALD) Al2O3 coatings are efficient barriers against gases and vapors. Al...
DoctorOrganic electronic devices such as organic light-emitting diodes (OLEDs) and organic thin film...
Several characterizations of nanolaminate Al2O3 (2 cycles)/ZnO (1 cycle) (Totally 50 stack) oxide fi...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
AbstractIn this study, atomic layer deposition (ALD) has been applied to deposit aluminum doped zinc...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Nanolaminates are unique nanocomposites that allow various thin film properties to be tuned by chang...
Perovskite solar cells must be coated with materials that are low moisture permeability due to moist...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
We investigated the characteristics of 100 nm-thick Al2O3/ZrO2 laminated films grown by ozone (O-3)-...
Organic electronic devices require a passivation layer that protects the active layers from moisture...
Atomic layer deposition (ALD) uses surface reactions of gaseous precursors to grow thin films of mat...
Rapid progress in the performance of organic devices has increased the demand for advances in the te...
Hybrid ZnO/Al2O3 layers grown by atomic layer deposition (ALD) at extremely low temperature (60 degr...
Thin atomic layer deposited (ALD) Al2O3 coatings are efficient barriers against gases and vapors. Al...
DoctorOrganic electronic devices such as organic light-emitting diodes (OLEDs) and organic thin film...
Several characterizations of nanolaminate Al2O3 (2 cycles)/ZnO (1 cycle) (Totally 50 stack) oxide fi...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
AbstractIn this study, atomic layer deposition (ALD) has been applied to deposit aluminum doped zinc...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Nanolaminates are unique nanocomposites that allow various thin film properties to be tuned by chang...
Perovskite solar cells must be coated with materials that are low moisture permeability due to moist...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
We investigated the characteristics of 100 nm-thick Al2O3/ZrO2 laminated films grown by ozone (O-3)-...
Organic electronic devices require a passivation layer that protects the active layers from moisture...
Atomic layer deposition (ALD) uses surface reactions of gaseous precursors to grow thin films of mat...