Today's electronic systems such as computers and digital communication systems, have necessitated a rapid increase in operating frequency. Because of this, VLSI interconnects have become one of the critical issues in an overall system design. Improperly designed interconnects lead to signal integrity degradations such as signal delay, cross talk and ground noise, limiting the overall system performance. In recent years, research into the interconnect optimization problem has been very active, and much important progress has been made. This article presents a review of the current status of this subject area. The formulations of signal-integrity oriented optimization of interconnects at different levels of electronics systems, that is, chip,...
Abstrnct-The propagation delay of interconnection lines is a major factor in determining the perform...
Interconnect tuning is an increasingly critical degree of freedom in the physical design of high-per...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
Today's electronic systems such as computers and digital communication systems, have necessitated a ...
This paper presents design optimization of time responses of high-speed VLSI interconnects modeled b...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Signal integrity issues such as delay and crosstalk are important in designing high-speed printed ci...
A multilevel optimization technique is developed for large-scale and hierarchical optimization of hi...
The goals of the work presented in this paper were to estimate quantitatively the impact of intercon...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
This paper presents an overview of recent advances on modeling and layout optimization of devices an...
Interconnect tuning is an increasingly critical degree of freedom in the design of high-performance ...
With the rapid increase in transmission speeds of communication systems, the demand for very high-sp...
With the rapid developments in VLSI technology, design, and CAD techniques, at both the chip and pac...
As semiconductor technology advances in the ultra deep sub -micron era, on-chip global interconnecti...
Abstrnct-The propagation delay of interconnection lines is a major factor in determining the perform...
Interconnect tuning is an increasingly critical degree of freedom in the physical design of high-per...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
Today's electronic systems such as computers and digital communication systems, have necessitated a ...
This paper presents design optimization of time responses of high-speed VLSI interconnects modeled b...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Signal integrity issues such as delay and crosstalk are important in designing high-speed printed ci...
A multilevel optimization technique is developed for large-scale and hierarchical optimization of hi...
The goals of the work presented in this paper were to estimate quantitatively the impact of intercon...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
This paper presents an overview of recent advances on modeling and layout optimization of devices an...
Interconnect tuning is an increasingly critical degree of freedom in the design of high-performance ...
With the rapid increase in transmission speeds of communication systems, the demand for very high-sp...
With the rapid developments in VLSI technology, design, and CAD techniques, at both the chip and pac...
As semiconductor technology advances in the ultra deep sub -micron era, on-chip global interconnecti...
Abstrnct-The propagation delay of interconnection lines is a major factor in determining the perform...
Interconnect tuning is an increasingly critical degree of freedom in the physical design of high-per...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...