A protocol has been devised for formulating low-vapor-pressure precursors for protective and conversion coatings on metallic and ceramic substrates. The ingredients of a precursor to which the protocol applies include additives with phosphate esters, or aryl phosphate esters in solution. Additives can include iron, chromium, and/or other transition metals. Alternative or additional additives can include magnesium compounds to facilitate growth of films on substrates that do not contain magnesium. Formulation of a precursor begins with mixing of the ingredients into a high-vapor-pressure solvent to form a homogeneous solution. Then the solvent is extracted from the solution by evaporation - aided, if necessary, by vacuum and/or slight heatin...
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing to...
In this grant period, the authors have explored the single-source precursor route to silicate materi...
The use of polymeric precursors to produce ceramics is generating considerable interest . Owing to d...
A protocol has been devised for formulating low-vapor-pressure precursors for protective and convers...
International audienceThe review describes the techniques of film and coatings deposition using solu...
A CVD method was successfully developed to produce conversion coatings on aluminum alloys surfaces w...
Coatings of Group IIA metals and compounds thereof are formed by chemical vapor deposition, in which...
International audienceDue to attractive surface properties and to intrinsic brittleness of Complex M...
PatentThe disclosure provides a method for generating a metallic coating on a substrate using a mixt...
An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R)....
A novel coating technique, referred to as Electrostatic Spray Deposition (ESD), was used to deposit ...
Contains fulltext : 58072.pdf (publisher's version ) (Closed access)A novel coatin...
Various metals, such as Ca, Mg, A1, Ti, Cr, Y, Zr, and Ta were anodically dissolved in an organic el...
Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic lay...
Abstract. Thin film deposition by chemical vapor deposition (CVD) techniques plays a dominant role i...
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing to...
In this grant period, the authors have explored the single-source precursor route to silicate materi...
The use of polymeric precursors to produce ceramics is generating considerable interest . Owing to d...
A protocol has been devised for formulating low-vapor-pressure precursors for protective and convers...
International audienceThe review describes the techniques of film and coatings deposition using solu...
A CVD method was successfully developed to produce conversion coatings on aluminum alloys surfaces w...
Coatings of Group IIA metals and compounds thereof are formed by chemical vapor deposition, in which...
International audienceDue to attractive surface properties and to intrinsic brittleness of Complex M...
PatentThe disclosure provides a method for generating a metallic coating on a substrate using a mixt...
An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R)....
A novel coating technique, referred to as Electrostatic Spray Deposition (ESD), was used to deposit ...
Contains fulltext : 58072.pdf (publisher's version ) (Closed access)A novel coatin...
Various metals, such as Ca, Mg, A1, Ti, Cr, Y, Zr, and Ta were anodically dissolved in an organic el...
Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic lay...
Abstract. Thin film deposition by chemical vapor deposition (CVD) techniques plays a dominant role i...
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing to...
In this grant period, the authors have explored the single-source precursor route to silicate materi...
The use of polymeric precursors to produce ceramics is generating considerable interest . Owing to d...