Amorphous thin films for solar cell application. Quarterly report No. 2, July 1-September 30, 1979
- Jonath, A D
- Crowley, J L
- MacMillan, H F
- Anderson, W W
- Junga, F A
- Kooi, C F
- McNab, T K
- Scoble, W R
- Thornton, J A
Publication date
October 1979
DOI Publisher
Lockheed Palo Alto Research Labs., CA (USA)Abstract
Research on the fabrication of efficient amorphous silicon solar cells is reported. Work on the deposition of a-Si:H films by sputtering is described. Other areas under scrutiny include (a) degree and effect of oxygen and/or argon incorporation into the films, (b) dopant transfer from target to films, (c) dopant and alloy ion-implantation effects, and (d) film annealing behavior. Results to date are presented. (WHK
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