Add to ORKGA discussion is presented concerning the method of setting up a saddle field ion source for sputtering thin films. Preliminary results will be presented for sputtering rates of different materials
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
The proceedings of a conference on sputtering and ion plating are presented. Subjects discussed are:...
Ion sources are used in vacuum thin film technology in various types and for numerous applications. ...
A variation of the von Ardenne type of a duoplasmatron ion source is described. Here the arc dischar...
This bachelor's thesis deals with the development of a new type of an ion source. The aim is to desi...
In conjunction with our experimental work on saddle field ion sputtering, we have attempted to apply...
Significant advancement have been made in sputter-type negative ion sources which utilize direct sur...
An ion-beam sputtering (IBS) system has been designed and developed for preparing thin films and mul...
Sputter deposition processes, especially for sputtering from metal targets, are well investigated. F...
Hundreds of research papers on various elements of sputtering have been published. The goal of this ...
Under ideal conditions ion plating produces finely grained dense coatings with excellent adhesion. T...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
Many of the current methods to sharpen field emitters are time consuming and can only process one fi...
Ion beam sputter deposition (IBSD) is an established physical vapour deposition technique that offer...
In this work, sputtering yield in a glow discharge ion source system has been determined using the o...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
The proceedings of a conference on sputtering and ion plating are presented. Subjects discussed are:...
Ion sources are used in vacuum thin film technology in various types and for numerous applications. ...
A variation of the von Ardenne type of a duoplasmatron ion source is described. Here the arc dischar...
This bachelor's thesis deals with the development of a new type of an ion source. The aim is to desi...
In conjunction with our experimental work on saddle field ion sputtering, we have attempted to apply...
Significant advancement have been made in sputter-type negative ion sources which utilize direct sur...
An ion-beam sputtering (IBS) system has been designed and developed for preparing thin films and mul...
Sputter deposition processes, especially for sputtering from metal targets, are well investigated. F...
Hundreds of research papers on various elements of sputtering have been published. The goal of this ...
Under ideal conditions ion plating produces finely grained dense coatings with excellent adhesion. T...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
Many of the current methods to sharpen field emitters are time consuming and can only process one fi...
Ion beam sputter deposition (IBSD) is an established physical vapour deposition technique that offer...
In this work, sputtering yield in a glow discharge ion source system has been determined using the o...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
The proceedings of a conference on sputtering and ion plating are presented. Subjects discussed are:...
Ion sources are used in vacuum thin film technology in various types and for numerous applications. ...