Add to ORKGAt the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in-situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. In this paper, we report an initial cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror. This cross-check provides a validation of the in-situ shearing interferometry currently under development at the ALS
This paper describes metrology of a vertically focusing mirror on the bending magnet beamline in sec...
We describe a technique to optimally tune and calibrate bendable x-ray optics for sub-micron focusin...
Future generations of microchips will probably be produced using extreme ultraviolet light with a wa...
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in-situ, at...
Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron ...
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at...
The comprehensive realization of the exciting advantages of new third- and forth-generation synchrot...
Realizing the experimental potential of high-brightness, next generation synchrotron and free-electr...
We report on a new research and development program at the Advanced Light Source, Lawrence Berkeley ...
We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at t...
We discuss experimental, analytical, and numerical methods recently developed at the Advanced Light ...
We present details of design of elliptically bent Kirkpatrick Baez mirrors developed and successfull...
We present details of design of elliptically bent Kirkpatrick-Baez mirrors developed and successfull...
We review the development at the Advanced Light Source (ALS) of bendable x-ray optics widely used fo...
We present recent results on the inspection of a first diffractionlimited hard X ray Kirkpatrick Bae...
This paper describes metrology of a vertically focusing mirror on the bending magnet beamline in sec...
We describe a technique to optimally tune and calibrate bendable x-ray optics for sub-micron focusin...
Future generations of microchips will probably be produced using extreme ultraviolet light with a wa...
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in-situ, at...
Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron ...
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at...
The comprehensive realization of the exciting advantages of new third- and forth-generation synchrot...
Realizing the experimental potential of high-brightness, next generation synchrotron and free-electr...
We report on a new research and development program at the Advanced Light Source, Lawrence Berkeley ...
We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at t...
We discuss experimental, analytical, and numerical methods recently developed at the Advanced Light ...
We present details of design of elliptically bent Kirkpatrick Baez mirrors developed and successfull...
We present details of design of elliptically bent Kirkpatrick-Baez mirrors developed and successfull...
We review the development at the Advanced Light Source (ALS) of bendable x-ray optics widely used fo...
We present recent results on the inspection of a first diffractionlimited hard X ray Kirkpatrick Bae...
This paper describes metrology of a vertically focusing mirror on the bending magnet beamline in sec...
We describe a technique to optimally tune and calibrate bendable x-ray optics for sub-micron focusin...
Future generations of microchips will probably be produced using extreme ultraviolet light with a wa...