Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using sterically bulky alkyl groups such as (CH_3)_2CH− (iso-propyl), (CH_3)_3C− (tert-butyl), and C_6H_5− (phenyl) moieties. X-ray photoelectron spectroscopic (XPS) data in the C 1s region of such surfaces exhibited a low energy emission at 283.9 binding eV, consistent with carbon bonded to Si. The C 1s XPS data indicated that the alkyls were present at lower coverages than methyl groups on CH_3-terminated Si(111) surfaces. Despite the lower alkyl group coverage, no Cl was detected after alkylation. Functionalization with the bulky alkyl groups effectively inhibited the oxidation of Si(111) surfaces in air and produced low (<100 cm s^(-1)) surfac...
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to invest...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...
Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using...
Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using...
Single-crystal Si(100) surfaces have been functionalized by using a two-step radical chlorination−Gr...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
Single-crystal Si(100) surfaces have been functionalized by using a two-step radical chlorination−Gr...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
A two-step procedure, involving radical-initiated chlorination of the Si surface with PCl_5 followed...
A two-step procedure, involving radical-initiated chlorination of the Si surface with PCl_5 followed...
The chemical, electronic, and structural properties of surfaces are affected by the chemical termina...
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to invest...
Functionalization of silicon semiconductor surfaces with mol. catalysts is of interest for the gener...
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to invest...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...
Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using...
Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using...
Single-crystal Si(100) surfaces have been functionalized by using a two-step radical chlorination−Gr...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
Single-crystal Si(100) surfaces have been functionalized by using a two-step radical chlorination−Gr...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
Four methods were used to functionalize crystalline Si(111) surfaces with alkyl groups (C_nH_(2n+1),...
A two-step procedure, involving radical-initiated chlorination of the Si surface with PCl_5 followed...
A two-step procedure, involving radical-initiated chlorination of the Si surface with PCl_5 followed...
The chemical, electronic, and structural properties of surfaces are affected by the chemical termina...
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to invest...
Functionalization of silicon semiconductor surfaces with mol. catalysts is of interest for the gener...
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to invest...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...
Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer t...