Redox Properties of Mixed Methyl/Vinylferrocenyl Monolayers on Si(111) Surfaces

We report the redox properties of Si(111) surfaces functionalized with a mixed monolayer of vinylferrocenyl and methyl moieties that have been characterized using spectroscopic, electrical, and electrochemical techniques. The silicon was functionalized using reaction conditions analogous to those of hydrosilylation, but instead of a H-terminated Si surface, a chlorine-terminated Si precursor surface was used to produce the linked vinyl-modified functional group. The functionalized surfaces were characterized by time-resolved photoconductivity decay, X-ray photoelectron spectroscopy, electrochemical measurements, and photoelectrochemical measurements. The functionalized Si surface was well passivated, exhibited high surface coverage and few remaining reactive Si atop sites, had a very low surface recombination velocity, and displayed little initial surface oxidation. The surface was stable toward atmospheric and electrochemical oxidation. The surface coverage of vinylferrocene (or fluorostyrene) was controllably varied from 0 up to 30% of a monolayer. Interfacial charge transfer to the attached ferrocene group was relatively rapid, and a photovoltage of 0.4 V was generated upon illumination of functionalized n-type silicon surfaces in CH_(3)CN